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公开(公告)号：US09147678B2
公开(公告)日：2015-09-29
申请号：US13342995
申请日：2012-01-04
Applicant: Chih-Kai Kang , Sheng-Yuan Hsueh , Shu-Hsuan Chih , Po-Kuang Hsieh , Chia-Chen Sun , Po-Cheng Huang , Shih-Chieh Hsu , Chi-Horn Pai , Yao-Chang Wang , Jie-Ning Yang , Chi-Sheng Tseng , Po-Jui Liao , Kuang-Hung Huang , Shih-Chang Chang
Inventor： Chih-Kai Kang , Sheng-Yuan Hsueh , Shu-Hsuan Chih , Po-Kuang Hsieh , Chia-Chen Sun , Po-Cheng Huang , Shih-Chieh Hsu , Chi-Horn Pai , Yao-Chang Wang , Jie-Ning Yang , Chi-Sheng Tseng , Po-Jui Liao , Kuang-Hung Huang , Shih-Chang Chang
CPC classification number: H01L27/0629 , H01L28/24
Abstract: The present invention provides a structure of a resistor comprising: a substrate having an interfacial layer thereon; a resistor trench formed in the interfacial layer; at least a work function metal layer covering the surface of the resistor trench; at least two metal bulks located at two ends of the resistor trench and adjacent to the work function metal layer; and a filler formed between the two metal bulks inside the resistor trench, wherein the metal bulks are direct in contact with the filler.
Abstract translation: 本发明提供一种电阻器的结构，包括：其上具有界面层的衬底; 形成在界面层中的电阻沟; 至少覆盖电阻沟槽表面的功函数金属层; 至少两个金属块，位于电阻沟槽的两端并邻近功函数金属层; 以及形成在电阻器沟槽内部的两个金属块之间的填料，其中金属块直接与填料接触。
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公开(公告)号：US20130168816A1
公开(公告)日：2013-07-04
申请号：US13342995
申请日：2012-01-04
Applicant: Chih-Kai Kang , Sheng-Yuan Hsueh , Shu-Hsuan Chih , Po-Kuang Hsieh , Chia-Chen Sun , Po-Cheng Huang , Shih-Chieh Hsu , Chi-Horn Pai , Yao-Chang Wang , Jie-Ning Yang , Chi-Sheng Tseng , Po-Jui Liao , Kuang-Hung Huang , Shih-Chang Chang
Inventor： Chih-Kai Kang , Sheng-Yuan Hsueh , Shu-Hsuan Chih , Po-Kuang Hsieh , Chia-Chen Sun , Po-Cheng Huang , Shih-Chieh Hsu , Chi-Horn Pai , Yao-Chang Wang , Jie-Ning Yang , Chi-Sheng Tseng , Po-Jui Liao , Kuang-Hung Huang , Shih-Chang Chang
CPC classification number: H01L27/0629 , H01L28/24
Abstract: The present invention provides a structure of a resistor comprising: a substrate having an interfacial layer thereon; a resistor trench formed in the interfacial layer; at least a work function metal layer covering the surface of the resistor trench; at least two metal bulks located at two ends of the resistor trench and adjacent to the work function metal layer; and a filler formed between the two metal bulks inside the resistor trench, wherein the metal bulks are direct in contact with the filler.
Abstract translation: 本发明提供一种电阻器的结构，包括：其上具有界面层的衬底; 形成在界面层中的电阻沟; 至少覆盖电阻沟槽表面的功函数金属层; 至少两个金属块，位于电阻沟槽的两端并邻近功函数金属层; 以及形成在电阻器沟槽内部的两个金属块之间的填料，其中金属块直接与填料接触。
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3.发明授权Test key structure and method for measuring step height by such test key structure 有权通过这种测试键结构测量步距的测试键结构和方法公开(公告)号：US08890551B2
公开(公告)日：2014-11-18
申请号：US13286230
申请日：2011-11-01
Applicant: Chih-Kai Kang , Shu-Hsuan Chih , Sheng-Yuan Hsueh , Chia-Chen Sun , Po-Kuang Hsieh , Chi-Horn Pai , Shih-Chieh Hsu
Inventor： Chih-Kai Kang , Shu-Hsuan Chih , Sheng-Yuan Hsueh , Chia-Chen Sun , Po-Kuang Hsieh , Chi-Horn Pai , Shih-Chieh Hsu
CPC classification number: H01L22/34 , H01L2924/0002 , H01L2924/00
Abstract: A test key structure for use in measuring step height includes a substrate, and a pair of test contacts. The substrate includes an isolation region and a diffusion region. The test contact pair includes a first test contact and a second test contact for measuring electrical resistances. The first test contact is disposed on the diffusion region and the second test contact is disposed on the isolation region.
Abstract translation: 用于测量台阶高度的测试键结构包括基板和一对测试触点。 衬底包括隔离区域和扩散区域。 测试触点对包括用于测量电阻的第一测试触点和第二测试触点。 第一测试触点设置在扩散区上，第二测试触点设置在隔离区上。
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4.发明申请TEST KEY STRUCTURE AND METHOD FOR MEASURING STEP HEIGHT BY SUCH TEST KEY STRUCTURE 有权通过这种测试关键结构测量步高的测试关键结构和方法公开(公告)号：US20130106448A1
公开(公告)日：2013-05-02
申请号：US13286230
申请日：2011-11-01
Applicant: Chih-Kai Kang , Shu-Hsuan Chih , Sheng-Yuan Hsueh , Chia-Chen Sun , Po-Kuang Hsieh , Chi-Horn Pai , Shih-Chieh Hsu
Inventor： Chih-Kai Kang , Shu-Hsuan Chih , Sheng-Yuan Hsueh , Chia-Chen Sun , Po-Kuang Hsieh , Chi-Horn Pai , Shih-Chieh Hsu
CPC classification number: H01L22/34 , H01L2924/0002 , H01L2924/00
Abstract: A test key structure for use in measuring step height includes a substrate, and a pair of test contacts. The substrate includes an isolation region and a diffusion region. The test contact pair includes a first test contact and a second test contact for measuring electrical resistances. The first test contact is disposed on the diffusion region and the second test contact is disposed on the isolation region.
Abstract translation: 用于测量台阶高度的测试键结构包括基板和一对测试触点。 衬底包括隔离区域和扩散区域。 测试触点对包括用于测量电阻的第一测试触点和第二测试触点。 第一测试触点设置在扩散区上，第二测试触点设置在隔离区上。
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