公开(公告)号：US20050217798A1

公开(公告)日：2005-10-06

申请号：US11088211

申请日：2005-03-22

申请人： Akira Sugiyama ,  Shuhichi Kitamura ,  Koji Murakami ,  Daisuke Takahashi ,  Shohzoh Yoshimoto

发明人： Akira Sugiyama ,  Shuhichi Kitamura ,  Koji Murakami ,  Daisuke Takahashi ,  Shohzoh Yoshimoto

IPC分类号： H05H1/24 ,  C23C16/50 ,  C23F1/00 ,  H01J37/32 ,  H01L21/304 ,  H01L21/3065

CPC分类号： H01J37/32009 ,  H01J37/32082 ,  H01J37/32532

摘要： The plasma processing apparatus includes main electrodes 5, 31 opposed to each other with a plasma processing space 15 interposed therebetween. The plasma processing apparatus further has a side electrode 6 opposed to side faces 5B-1, 5B-2 of the main electrode 5, as well as a side electrode 32 opposed to side faces 31B-1, 31B-2 of the main electrode 31. Therefore, in addition to the plasma processing space 15 between the main electrode 5 and the main electrode 31, an electric field can be formed in spaces between the side faces of the main electrodes 5, 31 and the side electrodes 6, 32, the spaces serving as predischarge areas 16-1, 16-2. By this electric field, processing gas present in the predischarge areas 16-1, 16-2 can be transformed into plasma. Electrons and excitation species of the plasma generated in these predischarge areas 16-1, 16-2 can be supplied directly to the plasma processing space 15.

摘要翻译： 等离子体处理装置包括彼此相对的主电极5,31，其间插入等离子体处理空间15。 等离子体处理装置还具有与主电极5的侧面5B-B-B-B-B相对的侧面电极6以及与侧面31B-1，31B-2相对的侧面电极32 主电极31.因此，除了主电极5和主电极31之间的等离子体处理空间15之外，可以在主电极5,31的侧面与侧电极6之间的空间中形成电场 ，32，用作预充电区域16-1,16-2的空间。通过该电场，存在于预充电区域16-1,16-2中的处理气体可以转换成等离子体。 在这些预放电区域16-1,16-2中产生的等离子体的电子和激发物质可以直接供应到等离子体处理空间15。