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    Fuel cell system with fuel reforming units
    1.
    发明授权
    Fuel cell system with fuel reforming units 有权
    具有燃料重整单元的燃料电池系统

    公开(公告)号：US08101306B2

    公开(公告)日：2012-01-24

    申请号：US11496588

    申请日：2006-08-01

    申请人： Soonho Kim ,  Doohwan Lee ,  Hyun-chul Lee ,  Eun-duck Park

    发明人： Soonho Kim ,  Doohwan Lee ,  Hyun-chul Lee ,  Eun-duck Park

    IPC分类号： H01M8/06

    CPC分类号： H01M8/0668 ,  H01M8/0612 ,  Y02P70/56

    摘要： A fuel cell system and an operating method of the same. The fuel cell system includes a carbon monoxide adsorbing device that is disposed at an exit of a shift reactor and removes carbon monoxide which is not completely removed in the shift reactor. Therefore, a start-up time of the fuel cell system is remarkably reduced without poisoning catalysts of electrodes of the fuel cell. An overall volume of the fuel cell system can be reduced since the carbon monoxide adsorbing device is only operating during the start-up, and thus the fuel cell system can be economically manufactured and operated. Additionally, the carbon monoxide adsorbent can be regenerated, thereby increasing economic efficiency of the fuel cell system.

    摘要翻译： 燃料电池系统及其操作方法。 燃料电池系统包括一个一氧化碳吸附装置，其设置在换档反应器的出口处，并且除去在换档反应器中未完全去除的一氧化碳。 因此，不会燃料电池的电极的催化剂中毒，燃料电池系统的启动时间显着降低。 由于一氧化碳吸附装置仅在起动时才起作用，所以能够降低燃料电池系统的总体积，能够经济地制造和运转燃料电池系统。 此外，可以再生一氧化碳吸附剂，从而提高燃料电池系统的经济效率。

    Patterning systems using photomasks including shadowing elements therein
    2.
    发明授权
    Patterning systems using photomasks including shadowing elements therein 有权
    使用光掩模的图案系统，包括其中的遮蔽元件

    公开(公告)号：US07605906B2

    公开(公告)日：2009-10-20

    申请号：US11757565

    申请日：2007-06-04

    申请人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    发明人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    IPC分类号： G03B27/54 ,  G03F1/00

    CPC分类号： G03F7/70191 ,  G02B5/1871 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0938 ,  G02B27/46 ,  G03F1/50

    摘要： A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation blocking regions may be on at least one of the first and/or second surfaces of the transparent substrate. Moreover, the pattern of radiation blocking regions may define a pattern to be transferred to the integrated circuit substrate. The array of shadowing elements may be provided within the transparent substrate between the first and second opposing surfaces wherein a shadowing element of the array has a light transmittance characteristic different than that of an adjacent portion of the transparent substrate. Moreover, a transmittance of the patterning radiation through a portion of the transparent substrate including the array of shadowing elements may be greater than approximately 20%. Related methods and systems are also discussed.

    摘要翻译： 用于使用图案化辐射来图案化集成电路器件的光掩模可以包括透明衬底，辐射阻挡区域的图案，辐射阻挡区域阵列以及阴影元件阵列。 透明基板可以具有第一和第二相对表面，并且辐射阻挡区域的图案可以在透明基板的第一和/或第二表面中的至少一个上。 此外，辐射阻挡区域的图案可以限定要传送到集成电路基板的图案。 阴影元件阵列可以设置在第一和第二相对表面之间的透明基板内，其中阵列的阴影元件具有与透明基板的相邻部分不同的透光特性。 此外，通过包括阴影元件阵列的透明基板的一部分的图案化辐射的透射率可以大于约20％。 还讨论了相关方法和系统。

    Methods of patterning using photomasks including shadowing elements therein and related systems
    3.
    发明授权
    Methods of patterning using photomasks including shadowing elements therein and related systems 有权
    使用包括其中的遮蔽元件的光掩模进行图案化的方法和相关系统

    公开(公告)号：US07604927B2

    公开(公告)日：2009-10-20

    申请号：US11668081

    申请日：2007-01-29

    申请人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    发明人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G02B5/1871 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0938 ,  G02B27/46 ,  G03F1/50

    摘要： A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation blocking regions may be on at least one of the first and/or second surfaces of the transparent substrate. Moreover, the pattern of radiation blocking regions may define a pattern to be transferred to the integrated circuit substrate. The array of shadowing elements may be provided within the transparent substrate between the first and second opposing surfaces wherein a shadowing element of the array has a light transmittance characteristic different than that of an adjacent portion of the transparent substrate. Moreover, a transmittance of the patterning radiation through a portion of the transparent substrate including the array of shadowing elements may be greater than approximately 20%. Related methods and systems are also discussed.

    摘要翻译： 用于使用图案化辐射来图案化集成电路器件的光掩模可以包括透明衬底，辐射阻挡区域的图案，辐射阻挡区域阵列以及阴影元件阵列。 透明基板可以具有第一和第二相对表面，并且辐射阻挡区域的图案可以在透明基板的第一和/或第二表面中的至少一个上。 此外，辐射阻挡区域的图案可以限定要传送到集成电路基板的图案。 阴影元件阵列可以设置在第一和第二相对表面之间的透明基板内，其中阵列的阴影元件具有与透明基板的相邻部分不同的透光特性。 此外，通过包括阴影元件阵列的透明基板的一部分的图案化辐射的透射率可以大于约20％。 还讨论了相关方法和系统。

    Startup method of fuel cell system
    4.
    发明申请
    Startup method of fuel cell system 审中-公开
    燃料电池系统启动方法

    公开(公告)号：US20070037022A1

    公开(公告)日：2007-02-15

    申请号：US11503149

    申请日：2006-08-14

    申请人： Soonho Kim ,  Hyun-chul Lee ,  Doohwan Lee ,  Dong-woo Lee ,  Tae-sang Park

    发明人： Soonho Kim ,  Hyun-chul Lee ,  Doohwan Lee ,  Dong-woo Lee ,  Tae-sang Park

    IPC分类号： H01M8/04

    CPC分类号： H01M8/0618 ,  H01M8/04022 ,  H01M8/04223 ,  H01M8/04302 ,  H01M8/0612 ,  H01M8/0675 ,  Y02P70/56

    摘要： In a startup method for fuel cell systems, and more particularly, a startup method which makes the fuel cell systems rapidly reach a steady state operation by significantly decreasing the time taken to increase the temperature of the shift reactor catalyst, gas discharged from a burner that heats a reformer is supplied into the shift reactor. In the startup method of the fuel cell system, the fuel cell systems rapidly reach a steady state operation thereby significantly improving the utility of the fuel cell system. In addition, the fuel cell system is economical in that gases discharged from burners included in the fuel cell system and waste heat are used.

    摘要翻译： 在燃料电池系统的启动方法中，更具体地，涉及一种使燃料电池系统快速达到稳态运行的启动方法，该方法通过显着减少增加变换反应器催化剂的温度所需的时间， 加热重整器供应到换档反应器中。 在燃料电池系统的启动方法中，燃料电池系统迅速达到稳态运行，从而显着提高燃料电池系统的效用。 此外，燃料电池系统是经济的，因为使用从包括在燃料电池系统中的燃烧器排出的气体和废热。

    Fuel cell system and operating method of the same
    5.
    发明申请
    Fuel cell system and operating method of the same 有权
    燃料电池系统及其操作方法相同

    公开(公告)号：US20070031707A1

    公开(公告)日：2007-02-08

    申请号：US11496588

    申请日：2006-08-01

    申请人： Soonho Kim ,  Doohwan Lee ,  Hyun-chul Lee ,  Eun-duck Park

    发明人： Soonho Kim ,  Doohwan Lee ,  Hyun-chul Lee ,  Eun-duck Park

    IPC分类号： H01M8/06

    CPC分类号： H01M8/0668 ,  H01M8/0612 ,  Y02P70/56

    摘要： A fuel cell system and an operating method of the same. The fuel cell system includes a carbon monoxide adsorbing device that is disposed at an exit of a shift reactor and removes carbon monoxide which is not completely removed in the shift reactor. Therefore, a start-up time of the fuel cell system is remarkably reduced without poisoning catalysts of electrodes of the fuel cell. An overall volume of the fuel cell system can be reduced since the carbon monoxide adsorbing device is only operating during the start-up, and thus the fuel cell system can be economically manufactured and operated. Additionally, the carbon monoxide adsorbent can be regenerated, thereby increasing economic efficiency of the fuel cell system.

    摘要翻译： 燃料电池系统及其操作方法。 燃料电池系统包括一个一氧化碳吸附装置，其设置在换档反应器的出口处，并且除去在换档反应器中未完全去除的一氧化碳。 因此，不会燃料电池的电极的催化剂中毒，燃料电池系统的启动时间显着降低。 由于一氧化碳吸附装置仅在起动时才起作用，所以能够降低燃料电池系统的总体积，能够经济地制造和运转燃料电池系统。 此外，可以再生一氧化碳吸附剂，从而提高燃料电池系统的经济效率。

    Photomasks including shadowing elements therein and related methods and systems
    7.
    发明授权
    Photomasks including shadowing elements therein and related methods and systems 有权
    光掩模包括其中的遮蔽元件以及相关的方法和系统

    公开(公告)号：US07241539B2

    公开(公告)日：2007-07-10

    申请号：US10775772

    申请日：2004-02-09

    申请人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    发明人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    IPC分类号： G03F1/00

    CPC分类号： G03F7/70191 ,  G02B5/1871 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0938 ,  G02B27/46 ,  G03F1/50

    摘要： A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation blocking regions may be on at least one of the first and/or second surfaces of the transparent substrate. Moreover, the pattern of radiation blocking regions may define a pattern to be transferred to the integrated circuit substrate. The array of shadowing elements may be provided within the transparent substrate between the first and second opposing surfaces wherein a shadowing element of the array has a light transmittance characteristic different than that of an adjacent portion of the transparent substrate. Moreover, a transmittance of the patterning radiation through a portion of the transparent substrate including the array of shadowing elements may be greater than approximately 20%. Related methods and systems are also discussed.

    摘要翻译： 用于使用图案化辐射来图案化集成电路器件的光掩模可以包括透明衬底，辐射阻挡区域的图案，辐射阻挡区域阵列以及阴影元件阵列。 透明基板可以具有第一和第二相对表面，并且辐射阻挡区域的图案可以在透明基板的第一和/或第二表面中的至少一个上。 此外，辐射阻挡区域的图案可以限定要传送到集成电路基板的图案。 阴影元件阵列可以设置在第一和第二相对表面之间的透明基板内，其中阵列的阴影元件具有与透明基板的相邻部分不同的透光特性。 此外，通过包括阴影元件阵列的透明基板的一部分的图案化辐射的透射率可以大于约20％。 还讨论了相关方法和系统。

    Methods of Patterning Using Photomasks Including Shadowing Elements Therein and Related Systems
    9.
    发明申请
    Methods of Patterning Using Photomasks Including Shadowing Elements Therein and Related Systems 有权
    使用光掩模进行图案化的方法，包括其中的阴影元素和相关系统

    公开(公告)号：US20070122751A1

    公开(公告)日：2007-05-31

    申请号：US11668081

    申请日：2007-01-29

    申请人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    发明人： SoonHo Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G02B5/1871 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0938 ,  G02B27/46 ,  G03F1/50

    摘要： A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation blocking regions may be on at least one of the first and/or second surfaces of the transparent substrate. Moreover, the pattern of radiation blocking regions may define a pattern to be transferred to the integrated circuit substrate. The array of shadowing elements may be provided within the transparent substrate between the first and second opposing surfaces wherein a shadowing element of the array has a light transmittance characteristic different than that of an adjacent portion of the transparent substrate. Moreover, a transmittance of the patterning radiation through a portion of the transparent substrate including the array of shadowing elements may be greater than approximately 20%. Related methods and systems are also discussed.

    摘要翻译： 用于使用图案化辐射来图案化集成电路器件的光掩模可以包括透明衬底，辐射阻挡区域的图案，辐射阻挡区域阵列以及阴影元件阵列。 透明基板可以具有第一和第二相对表面，并且辐射阻挡区域的图案可以在透明基板的第一和/或第二表面中的至少一个上。 此外，辐射阻挡区域的图案可以限定要传送到集成电路基板的图案。 阴影元件阵列可以设置在第一和第二相对表面之间的透明基板内，其中阵列的阴影元件具有与透明基板的相邻部分不同的透光特性。 此外，通过包括阴影元件阵列的透明基板的一部分的图案化辐射的透射率可以大于约20％。 还讨论了相关方法和系统。