公开(公告)号：US5102523A

公开(公告)日：1992-04-07

申请号：US603795

申请日：1990-10-25

申请人： Siegfried Beisswenger ,  Barbara Beichler ,  Michael Geisler ,  Stefan Reineck

发明人： Siegfried Beisswenger ,  Barbara Beichler ,  Michael Geisler ,  Stefan Reineck

IPC分类号： H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/3244 ,  H01J37/32532

摘要： The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.

摘要翻译： 本发明涉及一种用于制造等离子体以及用于将带电荷和不带电粒子施加到基底上的装置。 提供连接到电压源的两个区域电极，其间被高频能量激发的等离子体体积点燃。 两个电极的面积比是可变的，以便影响撞击在衬底上的离子的能量。 此外，可以在整个基板区域上分配的处理气体的供给。