公开(公告)号：US07230040B1

公开(公告)日：2007-06-12

申请号：US10836625

申请日：2004-05-03

Applicant: Steven R. Carlo ,  Eva M. Maya ,  Arthur W. Snow ,  Richard Gork Sim Pong

Inventor： Steven R. Carlo ,  Eva M. Maya ,  Arthur W. Snow ,  Richard Gork Sim Pong

IPC: C08K5/16

CPC classification number: C08K5/0041 ,  C08J3/205

Abstract: High concentrations of dye may be prepared in combination with thermoplastic polymers and used in optical polymers as monomeric and dimeric molecular solutions. The method of preparing high concentration levels allows the control over the aggregation of dye molecules that is required to maintain effective nonlinear operation. The present invention is applicable to many systems and is essential to the successful production of working optical limiting devices and other optically transparent polymeric devices, as well as other photonic applications, such as nonlinear optics.

Abstract translation: 可以与热塑性聚合物组合制备高浓度的染料，并将其用作光学聚合物作为单体和二聚体分子溶液。 制备高浓度水平的方法允许控制维持有效非线性操作所需的染料分子聚集。 本发明可应用于许多系统，并且对于成功生产工作光学限制装置和其它光学透明聚合物装置以及其它光子应用（例如非线性光学器件）是必需的。

公开(公告)号：US07652078B2

公开(公告)日：2010-01-26

申请号：US11746499

申请日：2007-05-09

Applicant: Steven R. Carlo ,  Eva M. Maya ,  Arthur W. Snow ,  Richard G. S. Pong

Inventor： Steven R. Carlo ,  Eva M. Maya ,  Arthur W. Snow ,  Richard G. S. Pong

IPC: C08K5/16

CPC classification number: C08K5/0041 ,  C08J3/205

Abstract: High concentrations of dye may be prepared in combination with thermoplastic polymers and used in optical polymers as monomeric and dimeric molecular solutions. The method of preparing high concentration levels allows the control over the aggregation of dye molecules that is required to maintain effective nonlinear operation. The present invention is applicable to many systems and is essential to the successful production of working optical limiting devices and other optically transparent polymeric devices, as well as other photonic applications, such as nonlinear optics.

Abstract translation: 可以与热塑性聚合物组合制备高浓度的染料，并将其用作光学聚合物作为单体和二聚体分子溶液。 制备高浓度水平的方法允许控制维持有效非线性操作所需的染料分子聚集。 本发明可应用于许多系统，并且对于成功生产工作光学限制装置和其它光学透明聚合物装置以及其它光子应用（例如非线性光学器件）是必需的。