公开(公告)号：US20090142489A1

公开(公告)日：2009-06-04

申请号：US12295696

申请日：2007-07-30

申请人： Tai Joon Um ,  Young Cheol Joo ,  Sang Wook Lee ,  Kug Weon Kim

发明人： Tai Joon Um ,  Young Cheol Joo ,  Sang Wook Lee ,  Kug Weon Kim

IPC分类号： C23C16/02

CPC分类号： C23C14/243

摘要： Linear deposition sources are disclosed. In one embodiment, the linear deposition source includes a container accommodating evaporation material and a heater configured to generate heat energy such that vaporized material is discharged uniformly onto a substrate on which a deposition layer is formed. The heater is provided on the container, wherein a portion of the heater positioned at a center portion of the container in the longitudinal direction generates more heat energy than the other portion of the heater. The heater includes a coil configured in a sinusoidal pattern, wherein the curvature pitch or height of the portion of the coil positioned at the center portion of the container in the longitudinal direction is set to be different from that of the other portion of the coil. Further, the resistance of the portion of the coil positioned at the center portion of the container in the longitudinal direction may be set to be greater than that of the other portion of the coil.

摘要翻译： 公开了线性沉积源。 在一个实施例中，线性沉积源包括容纳蒸发材料的容器和被配置为产生热能的加热器，使得气化材料均匀地排出到其上形成有沉积层的基板上。 加热器设置在容器上，其中位于容器的纵向方向中心部分的加热器的一部分产生比加热器的其它部分更多的热能。 加热器包括以正弦图案配置的线圈，其中位于容器的纵向中心部分处的线圈的曲率间距或高度被设定为与线圈的另一部分不同。 此外，位于容器的中心部分的线圈的沿纵向的部分的电阻可以被设定为大于线圈的另一部分的电阻。

公开(公告)号：US20090250007A1

公开(公告)日：2009-10-08

申请号：US12295689

申请日：2007-07-30

申请人： Kug Weon Kim ,  Tai Joon Um ,  Young Cheol Joo ,  Sang Wook Lee

发明人： Kug Weon Kim ,  Tai Joon Um ,  Young Cheol Joo ,  Sang Wook Lee

IPC分类号： C23C16/54

CPC分类号： C23C16/54 ,  C23C14/243

摘要： An apparatus for increasing uniformity of thin films deposited on a substrate includes multiple deposition sources to accommodate and discharge evaporation material. A member supports the deposition sources in a selected arrangement. A heater can be used to apply heat to the deposition sources. In another embodiment, the apparatus can include a container to accommodate evaporation material. The container may include aperture at or near its center. A cover caps an opening of the container and includes multiple gas outlets. The apparatus further includes a heater disposed along an inner surface of the aperture and along an outer surface of the container.

摘要翻译： 用于提高沉积在基板上的薄膜均匀性的装置包括多个沉积源以容纳和排出蒸发材料。 成员以所选择的布置支撑沉积源。 加热器可用于对沉积源施加热量。 在另一个实施例中，该装置可以包括容纳蒸发材料的容器。 容器可以包括在其中心处或附近的孔。 盖子盖住容器的开口并且包括多个气体出口。 该装置还包括沿着孔的内表面并沿着容器的外表面设置的加热器。