公开(公告)号：US20120129102A1

公开(公告)日：2012-05-24

申请号：US13266589

申请日：2010-04-20

申请人： Hiroyuki Soda ,  Takahiro Sakaruchi ,  Shojiro Yuwaka

发明人： Hiroyuki Soda ,  Takahiro Sakaruchi ,  Shojiro Yuwaka

IPC分类号： G03F7/20 ,  G03F7/028

CPC分类号： G02B1/041 ,  C08F290/14 ,  G03F7/027 ,  G03F7/032 ,  G03F7/0388

摘要： A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive composition includes a photopolymerizable polymer (A) having a fluorene skeleton, a monomer (B) having a fluorene skeleton and a photopolymerization initiator (C). The photopolymerizable polymer (A) having a fluorene skeleton may include a moiety that is soluble in an alkaline developer solution, or a unit structure of Formula (1): herein each R1 is independently a C1-10 alkyl group or a halogen atom; each L is an integer of 0 to 4; X is an organic group having an unsaturated bond at a terminal thereof; and Y is a linking group including a portion that is obtained by removing an acid radical from a tetracarboxylic dianhydride.

摘要翻译： 用于平坦化膜，间隔物和微透镜的材料，其在不损害折射率的情况下满足耐热性和透明度要求。 负型感光性组合物包含具有芴骨架的光聚合性聚合物（A），具有芴骨架的单体（B）和光聚合引发剂（C）。 具有芴骨架的可光聚合的聚合物（A）可以包括可溶于碱性显影剂溶液的部分或式（1）的单元结构：其中，R 1各自独立地为C 1-10烷基或卤素原子; 每个L为0〜4的整数; X是在其末端具有不饱和键的有机基团; Y是包含通过从四羧酸二酐除去酸基获得的部分的连接基团。