Substrate treatment apparatus, substrate treatment method and substrate manufacturing method
    1.
    发明申请
    Substrate treatment apparatus, substrate treatment method and substrate manufacturing method 审中-公开
    基板处理装置,基板处理方法及基板的制造方法

    公开(公告)号:US20050022930A1

    公开(公告)日:2005-02-03

    申请号:US10813926

    申请日:2004-03-31

    摘要: Above a substrate mounted on rollers, an upper board is prepared a predetermined distance apart from the substrate. A pipe fills a space between the upper board and the substrate with washing water by supplying the washing water at a predetermined flow rate. A washing water layer is formed evenly on an upper surface of the substrate when the substrate passes below the upper board. Below the substrate, a lower board is prepared a predetermined distance apart from the substrate. A pipe fills a space between the lower board and the substrate with the washing water by supplying the washing water at a predetermined flow rate. A washing water layer is formed evenly on a lower surface of the substrate when the substrate passes above the lower board. The air emitted from an air knife is sprayed to the upper/lower surface of the substrate slantingly at a predetermined incident angle in an opposite direction of a substrate moving direction. The washing water is pushed away and removed from the upper/lower surface of the substrate.

    摘要翻译: 在安装在辊上的基板上方,准备与基板隔开预定距离的上板。 管道通过以预定的流量供给洗涤水,用洗涤水填充上板和基板之间的空间。 当基板通过上板下方时,洗涤水层均匀地形成在基板的上表面上。 在基板下方,准备与基板隔开预定距离的下板。 通过以预定的流量供给洗涤水,管道用洗涤水填充下板和基板之间的空间。 当基板通过下板上方时,洗涤水层均匀地形成在基板的下表面上。 从气刀喷出的空气以与基板移动方向相反的方向倾斜地以规定的入射角度向基板的上下表面喷射。 将洗涤水从基材的上/下表面推开并除去。