公开(公告)号：US20110117289A1

公开(公告)日：2011-05-19

申请号：US12808391

申请日：2008-12-12

申请人： Nobuhiro Hayashi ,  Yosuke Kobayashi ,  Takao Saitou ,  Masayuki Iijima ,  Isao Tada

发明人： Nobuhiro Hayashi ,  Yosuke Kobayashi ,  Takao Saitou ,  Masayuki Iijima ,  Isao Tada

IPC分类号： C23C16/02 ,  B05C13/00 ,  B05C11/00 ,  C23C16/448 ,  C23C16/50 ,  C23C16/455 ,  C23C16/458 ,  C23C14/34

CPC分类号： C23C14/56 ,  C23C16/4412 ,  C23C16/54

摘要： [Object] To provide a deposition apparatus and a deposition method that are capable of reducing an evacuation time in an evacuation system having a large condensing load to improve productivity.[Solving Means] A deposition apparatus that forms a film on a plurality of base materials at the same time, includes a support unit including a support section that rotatably supports the plurality of base materials around a rotation shaft, a vacuum chamber including a cylindrical processing chamber that rotatably accommodates the support unit, deposition sources provided inside the vacuum chamber, a low temperature evacuation section including a low temperature condensation source provided opposed to an upper support member on an upper surface of the vacuum chamber, and auxiliary pumps.

摘要翻译： 本发明提供能够减小具有大的冷凝负荷的抽空系统中的抽空时间以提高生产率的沉积设备和沉积方法。 [解决方案]同时在多个基材上形成膜的沉积装置包括支撑单元，该支撑单元包括可旋转地支撑围绕旋转轴的多个基材的支撑部，包括圆柱形处理的真空室 可旋转地容纳支撑单元的腔室，设置在真空室内部的沉积源，包括与真空室的上表面上的上支撑构件相对设置的低温冷凝源的低温抽空区域和辅助泵。