公开(公告)号：US5459577A

公开(公告)日：1995-10-17

申请号：US310987

申请日：1994-09-23

申请人： Taro Ototake ,  Takashi Endo ,  Hisao Izawa ,  Kazuhiro Takaoka

发明人： Taro Ototake ,  Takashi Endo ,  Hisao Izawa ,  Kazuhiro Takaoka

IPC分类号： G01B11/30 ,  G03F7/20

CPC分类号： G03F7/70691 ,  G01B11/306

摘要： A pattern position measuring method measures two-dimensional positions of a hyperfine pattern formed on the surface of a substrate. This method comprises a pattern position measuring step of measuring the positions of the pattern in a first flexural configuration produced in a supported state where the measured substrate is supported in first a plurality of positions of the measured substrate on a stage, a flexural configuration detecting step of detecting the first flexural configuration of the surface of the measured substrate, and a correcting step of correcting the pattern positions in the first flexural configuration that are measured by the pattern position measuring step to pattern positions in a second flexural configuration on the basis of the pattern positions in the first flexural configuration that are measured by the pattern position measuring step, the first flexural configuration detected by the flexural configuration detecting step and the previously stored second flexural configuration of the surface of the measured substrate which is produced when the measured substrate is supported in a second plurality of positions different from the first plurality of positions.

摘要翻译： 图案位置测量方法测量形成在基底表面上的超精细图案的二维位置。 该方法包括图案位置测量步骤，该图案位置测量步骤首先测量在支撑状态下产生的第一弯曲构造中的图案的位置，其中所测量的基底首先被支撑在测量的基底的多个位置，弯曲构造检测步骤 检测所测量的基板的表面的第一弯曲构造;以及校正步骤，用于校正通过图案位置测量步骤测量的第一弯曲构造中的图案位置，以基于第二弯曲构造来对第二弯曲构造中的图案位置进行 通过图案位置测量步骤测量的第一弯曲构造中的图案位置，由弯曲构造检测步骤检测到的第一弯曲构造和当测量的基底是测量的基底时产生的测量的基底的表面的先前存储的第二弯曲构造 支持在第二个pl 不同于第一组多个职位的职位。

公开(公告)号：US5786897A

公开(公告)日：1998-07-28

申请号：US665300

申请日：1996-06-17

申请人： Taro Ototake

发明人： Taro Ototake

IPC分类号： G01B11/00 ,  G01B11/03 ,  G01B21/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70716 ,  G01B11/002 ,  G03F9/70

摘要： Pattern coordinates which have been measured on a substrate such as reticle, a mask or the like are also accurately reflected when this reticle is mounted to an exposure device. Thus, measurement deviations are suppressed. In accordance with the present invention, the device for measuring pattern coordinates includes an XY stage for the reticle to be mounted upon and a detection system for measuring the pattern on the reticle. The detection system is arranged under the XY stage and is made up of an objective lens and an optical detection system. The device for measuring pattern coordinates further includes a device for detecting the position of the XY stage comprising X and Y axis interferometers. The reticle is mounted upon the XY stage with its pattern surface facing downwards. This direction is the same orientation as when it is mounted in an exposure device. A laser beam is focused upon the pattern surface from under the XY stage. The pattern upon the reticle is detected by light scattered from the edges of the pattern. This light is detected by the detection system. When the pattern is detected, the position of the XY stage is read out from the X axis and Y axis interferometers.

摘要翻译： 当将掩模版安装到曝光装置时，也可以在诸如掩模版，掩模等的基板上测量的图案坐标被精确地反射。 因此，测量偏差被抑制。 根据本发明，用于测量图案坐标的装置包括用于安装的掩模版的XY平台和用于测量掩模版上的图案的检测系统。 检测系统设置在XY平台下，由物镜和光学检测系统组成。 用于测量图案坐标的装置还包括用于检测包括X和Y轴干涉仪的XY台的位置的装置。 掩模版安装在XY台上，其图案表面朝下。 该方向与安装在曝光装置中的方向相同。 激光束从XY平台下方聚焦在图案表面上。 通过从图案的边缘散射的光来检测掩模版上的图案。 该光由检测系统检测。 当检测到图案时，从X轴和Y轴干涉仪读出XY平台的位置。

公开(公告)号：US5386294A

公开(公告)日：1995-01-31

申请号：US210768

申请日：1994-03-21

申请人： Taro Ototake ,  Yasuko Maeda ,  Takakazu Ueki

发明人： Taro Ototake ,  Yasuko Maeda ,  Takakazu Ueki

IPC分类号： G01B21/00 ,  G01B21/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F9/00

摘要： Position of a pattern of a sample placed on a stage is detected by detecting position of a pattern edge. Distortion of the whole sample surface is detected by measuring height of the sample, slope of the surface of the sample at a detected pattern edge position is calculated, and the detected position of the pattern edge is corrected in accordance with the calculated slope.

摘要翻译： 通过检测图案边缘的位置来检测放置在台架上的样品的图案的位置。 通过测量样品的高度来检测整个样品表面的变形，计算检测到的图案边缘位置处的样品表面的斜率，并根据计算的斜率校正检测到的图案边缘的位置。

公开(公告)号：US4730927A

公开(公告)日：1988-03-15

申请号：US849754

申请日：1986-04-09

申请人： Taro Ototake ,  Tatsumi Ishizeki

发明人： Taro Ototake ,  Tatsumi Ishizeki

IPC分类号： G01B21/00 ,  G01B11/00 ,  G01B11/30

CPC分类号： G01B11/002 ,  G01B11/303

摘要： A method and apparatus for the precision measurement of positions, dimensions, etc., of a pattern or mark formed on the surface of a flat object such as a photographic mask or reticle. The amount of vertical deviation of the object with respect to a reference plane is detected at each of a plurality of measuring points and the incline of the surface of the object with respect to the reference plane at each of the measuring points is determined in accordance with the amounts of deviation and the distance between the measuring points. The coordinate positions of each of the measuring points in the reference plane are measured in accordance with the amount of movement of the object parallel to the reference plane and the coordinate positions are corrected in accordance with the corresponding incline.

摘要翻译： 用于精确测量形成在诸如照相掩模或掩模版的平坦物体的表面上的图案或标记的位置，尺寸等的方法和装置。 在多个测量点的每个测量点处检测物体相对于参考平面的垂直偏移量，并且根据每个测量点在物体表面相对于基准平面的倾斜度确定 偏差量和测量点之间的距离。 根据与基准平面平行的物体的移动量来测量参考平面中的每个测量点的坐标位置，并且根据相应的倾斜度来校正坐标位置。