公开(公告)号：US20240310525A1

公开(公告)日：2024-09-19

申请号：US18671823

申请日：2024-05-22

申请人： LEICA GEOSYSTEMS AG

发明人： Simon MARK ,  Klaus BEREUTER ,  Benjamin MÜLLER ,  Roman STEFFEN ,  Burkhard BÖCKEM ,  Jürgen DOLD ,  Jochen SCHEJA ,  Lukas HEINZLE ,  Charles Leopold Elisabeth DUMOULIN

IPC分类号： G01S17/89 ,  G01B11/00 ,  G01B11/02 ,  G01B11/22 ,  G01S7/48 ,  G01S7/481 ,  G01S7/497 ,  G01S17/42 ,  G01S17/894 ,  G06T11/00

CPC分类号： G01S17/89 ,  G01S7/4813 ,  G01S7/4817 ,  G01S7/4972 ,  G01S17/42 ,  G01B11/00 ,  G01B11/002 ,  G01B11/024 ,  G01B11/22 ,  G01S7/4808 ,  G01S7/4811 ,  G01S7/4814 ,  G01S17/894 ,  G06T11/00 ,  G06T2207/10028

摘要： A laser scanner and a system with a laser scanner for measuring an environment. The laser scanner includes an optical distance measuring device, a support, a beam steering unit rotatably fixed to the support which rotates around a beam axis of rotation. The beam steering unit includes a mirrored surface which deflects radiation used in the optical distance measurement and an angle encoder for recording angle data. The optical distance measurement is performed by a progressive rotation of the beam steering unit about the beam axis of rotation and the continuous emission of a distance measurement radiation, the emission being made through an outlet area arranged in the direction of the mirrored surface on the support, the receiving optics for receiving radiation are 10 arranged on the support, and wherein the outlet area has a lateral offset with respect to the optical axis of the receiving optics.

公开(公告)号：US12072175B2

公开(公告)日：2024-08-27

申请号：US18166695

申请日：2023-02-09

申请人： CANON KABUSHIKI KAISHA

发明人： Wataru Yamaguchi

IPC分类号： G01B11/00 ,  G01B11/27 ,  G01J9/00 ,  G02B26/06 ,  G02B27/00 ,  G03F7/00 ,  G03F9/00

CPC分类号： G01B11/002 ,  G01B11/272 ,  G01J9/00 ,  G02B26/06 ,  G02B27/0068 ,  G03F7/706 ,  G03F9/7088

摘要： A measurement apparatus including an illumination system configured to illuminate a target with light including light of a first wavelength and light of a second wavelength, a wavefront changing unit configured to change a wavefront aberration in light from the target, and a control unit configured to control the wavefront changing unit, wherein the wavefront changing unit includes a first region where the light of the first wavelength enters, and a second region where the light of the second wavelength enters, and the control unit controls the wavefront changing unit such that a first correction wavefront for correcting a first wavefront aberration in the light of the first wavelength is generated in the first region, and a second correction wavefront for correcting a second wavefront aberration in the light of the second wavelength is generated in the second region.

公开(公告)号：US20240271924A1

公开(公告)日：2024-08-15

申请号：US18569825

申请日：2022-11-30

申请人： MITSUBISHI POWER, LTD. ,  MITSUBISHI HEAVY INDUSTRIES, LTD.

发明人： Satoshi Kumagai ,  Shunsuke Mizumi ,  Koji Ishibashi ,  Masato Kurita

IPC分类号： G01B11/00 ,  F01D21/00 ,  F01D25/24

CPC分类号： G01B11/002 ,  F01D21/003 ,  F01D25/243 ,  F05D2260/31

摘要： In a method for estimating flange displacement amount, effective three-dimensional coordinate data at a lower first position on a surface continuous with a lower flange surface of a first supported portion and at an upper first position coincident with the lower first position in the horizontal direction on a surface continuous with an upper flange surface are determined. The effective three-dimensional coordinate data at the respective positions are changed such that the effective three-dimensional coordinate data at the lower first position and the effective three-dimensional coordinate data at the upper first position are coincident with each other. In accordance with a difference between a position in a vertical direction indicated by the effective three-dimensional coordinate data at an upper target position on the upper flange surface after a coordinate change and a position in the vertical direction indicated by the effective three-dimensional coordinate data at a lower target position on the lower flange surface after a coordinate change, displacement amounts of the upper target position and the lower target position in the vertical direction when a state changes from an open state to a fastened state are obtained.

公开(公告)号：US12052501B2

公开(公告)日：2024-07-30

申请号：US17670225

申请日：2022-02-11

申请人： QUALITY VISION INTERNATIONAL INC.

发明人： Stephanie M. Bloch ,  Timothy Gerard Moriarty ,  Daniel C. Abbas

IPC分类号： H04N23/69 ,  G01B11/00 ,  H04N25/76

CPC分类号： H04N23/69 ,  G01B11/002 ,  H04N25/76

摘要： An optical imaging system for a dimensional measuring machine including a digital sensor having an array of addressable pixels, a lens system that provides for forming an image of a test object on the digital sensor, and a variable size aperture of the lens that changes an f-number of the lens system for imaging points of the test object on the digital sensor at different spot sizes. An aperture controller varies the aperture size. An image controller groups contiguous clusters of one or more of the pixels having a common output such that the number of pixels within each of the clusters having a common output can be varied. A magnification controller that works in conjunction with the aperture controller and the image controller provides for (a) increasing the number of pixels within each of the clusters having a common output in accordance with an increase in the spot sizes at which points of the test object are imaged and (b) decreasing the number of pixels within each of the clusters having a common output in accordance with a decrease in the spot sizes at which points of the test object are imaged.

公开(公告)号：US12007483B2

公开(公告)日：2024-06-11

申请号：US17081431

申请日：2020-10-27

申请人： FARO Technologies, Inc.

发明人： Jacob J. Mertz ,  Jun Li ,  Michael Ferrara ,  Robert E. Bridges

IPC分类号： G01S17/42 ,  G01B11/00 ,  G01C15/00 ,  G01S7/481 ,  G01S7/497 ,  G01S17/36 ,  G01S17/66 ,  G02B6/32 ,  G02F1/095 ,  H01S5/024 ,  H01S5/042 ,  H01S5/062 ,  H01S5/068

CPC分类号： G01S17/42 ,  G01B11/002 ,  G01C15/002 ,  G01S7/4814 ,  G01S7/4818 ,  G01S7/497 ,  G01S17/36 ,  G01S17/66 ,  G02B6/32 ,  G02F1/0955 ,  G02F2203/21 ,  H01S5/02415 ,  H01S5/0427 ,  H01S5/062 ,  H01S5/068

摘要： A coordinate measuring device is provided having a light source that emits a beam of light. A distance meter measures a distance to a target. A first locator camera assembly includes a first camera and first lights. A second locator camera assembly includes a second camera and second lights. The processor matches retroreflectors in a first image of the first camera and a second image of the second camera based on a shape-and-context matching of retroreflector spots in the first and second image and on an area-context-matching of background objects in the first and second image. The retroreflector spots in the first image produced by illumination of the retroreflectors by the first lights, the retroreflector spots in the second image produced by illumination of the retroreflectors by the second lights. The processor provides a third image that includes both the background objects and markers indicating the matched retroreflectors.

公开(公告)号：US11977034B2

公开(公告)日：2024-05-07

申请号：US17194558

申请日：2021-03-08

申请人： ASML Netherlands B.V.

发明人： Wouter Lodewijk Elings ,  Franciscus Bernardus Maria Van Bilsen ,  Christianus Gerardus Maria De Mol ,  Everhardus Cornelis Mos ,  Hoite Pieter Theodoor Tolsma ,  Peter Ten Berge ,  Paul Jacques Van Wijnen ,  Leonardus Henricus Marie Verstappen ,  Gerald Dicker ,  Reiner Maria Jungblut ,  Chung-Hsun Li

IPC分类号： G01B11/14 ,  G01B11/00 ,  G01B11/02 ,  G01B11/26 ,  G01N21/95 ,  G01N21/956 ,  G03F7/00 ,  G05B19/418 ,  H01L21/66

CPC分类号： G01N21/9501 ,  G01B11/002 ,  G01B11/02 ,  G01B11/14 ,  G01B11/26 ,  G01N21/956 ,  G01N21/95607 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633 ,  G05B19/41875 ,  H01L22/20 ,  G05B2219/37224 ,  Y02P90/02

摘要： In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.

公开(公告)号：US11921409B2

公开(公告)日：2024-03-05

申请号：US17358511

申请日：2021-06-25

申请人： FARO Technologies, Inc.

发明人： Maxime Isabelle ,  Matthew T. Armstrong ,  Salvatore DiAngelus ,  Leonardo Martinez ,  Joel H. Stave

IPC分类号： G03B21/20 ,  G01B11/00 ,  G01B11/25

CPC分类号： G03B21/2033 ,  G01B11/002 ,  G01B11/2513

摘要： A light projector and method of aligning the light projector is provided. A light projector steers an outgoing beam of light onto an object, passing light returned from the object through a focusing lens onto an optical detector. The light projector may generate a light pattern or template by rapidly moving the outgoing beam of light along a path on a surface. To place the light pattern/template in a desired location, the light projector may be aligned with an electronic model.

公开(公告)号：US11898835B2

公开(公告)日：2024-02-13

申请号：US17285292

申请日：2019-10-14

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Michel Cardoso ,  Thomas Desrez ,  Sebastien Bey

IPC分类号： G01B11/02 ,  G01B11/00 ,  G01B5/016 ,  G06V10/24 ,  G06V20/52

CPC分类号： G01B11/002 ,  G01B5/016 ,  G01B11/007 ,  G06V10/245 ,  G06V20/52

摘要： A method for configuring a device for non-destructive testing of a mechanical part, the device including an optical motion-tracking system, a non-destructive testing probe fixedly linked to a first rigid body, and a pointing device, includes steps of: learning of an origin and of axes of an examination area of the surface of the mechanical part using the pointing device, in a coordinate system linked to the optical motion-tracking system, so as to define a coordinate system linked to the examination area, learning of an origin and of axes of an emitter and receiver surface, called active surface, of the probe using the pointing device, in a coordinate system linked to the first rigid body of the probe, and determination of the position and of the orientation of the active surface of the probe, in the coordinate system linked to the examination area.

公开(公告)号：US11892279B2

公开(公告)日：2024-02-06

申请号：US17291034

申请日：2019-11-04

申请人： trinamiX GmbH

发明人： Sebastian Valouch ,  Celal Mohan Oeguen ,  Robert Send ,  Ingmar Bruder

IPC分类号： G01B11/00 ,  G01N21/25

CPC分类号： G01B11/002 ,  G01N21/25 ,  G01N2201/08

摘要： Described herein is a detector (110) for determining a position of at least one object (112). The detector (110) includes:



at least one transfer device (114) with chromatic aberration;
at least one aperture element (118), wherein the aperture element (118) is configured to block edge components of a light beam (120) propagating from the object (112) to the detector (110) and having passed the transfer device (114);
at least one first optical sensor (126) positioned in a direction of propagation of the light beam (120) behind the aperture element (118); and
at least one second optical sensor (128), wherein the second optical sensor (128) is configured to determine at least one second intensity information of the edge components of the light beam (120).

公开(公告)号：US20240027917A1

公开(公告)日：2024-01-25

申请号：US18021401

申请日：2020-08-18

申请人： NIKON CORPORATION

发明人： Yoji WATANABE

IPC分类号： G03F7/00 ,  G01B11/00

CPC分类号： G03F7/70591 ,  G01B11/002

摘要： An exposure apparatus includes: an exposure illumination optical system illuminating a spatial light modulator which has a plurality of spatial light modulation elements having a reflecting surface disposed on a disposition plane; a projection optical system projecting light from the spatial light modulator to an exposed substrate; a first detection unit detecting light from the reflecting surface; a second detection unit which is a detection unit detecting light from the reflecting surface and has a detection field of view larger than that of the first detection unit; and a position changing mechanism changing a positional relationship among the first detection unit, the second detection unit, and the spatial light modulator to either a first positional relationship in which the spatial light modulator faces the first detection unit and a second positional relationship in which the spatial light modulator faces the second detection unit.