Variable filters used with radiation source to reduce unobstructed
detector area
    1.
    发明授权
    Variable filters used with radiation source to reduce unobstructed detector area 失效
    与辐射源一起使用的可变滤波器,以减少无障碍的检测器面积

    公开(公告)号:US5552606A

    公开(公告)日:1996-09-03

    申请号:US439134

    申请日:1995-05-11

    Abstract: A variable filter arrangement wherein differently sized and shaped filters are automatically selected and installed from a collection of filters housed within a configuration for use with a radiation source. The line source is typically used for transmission scanning to collect attenuation correction factors. A line source is utilized in the preferred embodiment and a series of filters (e.g., differently sized "bow-tie" filters) are rotatably attached to a central junction so that a particular filter can be rotated into an installed position. When installed, the filter acts to attenuate the radiation emitted from the line source to reduce radiation emitted on an otherwise unobstructed area of a scintillation detector. Differently sized filters are advantageously used to accommodate differently sized patents and also to accommodate different unobstructed parts of a detector for different angles of rotation during an ECT transmission scan. The system includes processing intelligence to automatically select the proper filter given body contour (e.g., profile) information.

    Abstract translation: 可变过滤器装置,其中不同尺寸和形状的过滤器被自动选择并从容纳在用于辐射源的配置内的过滤器的集合中安装。 线源通常用于传输扫描以收集衰减校正因子。 在优选实施例中使用线源,并且一系列过滤器(例如,不同尺寸的“蝴蝶结”过滤器)可旋转地附接到中心连接点,使得特定的过滤器可以旋转到安装位置。 当安装时,滤波器用于衰减从线源发射的辐射,以减少在闪烁检测器的其他无阻挡区域上发射的辐射。 不同大小的过滤器有利地用于适应不同大小的专利,并且还可以在ECT传输扫描期间适应不同旋转角度的检测器的不同的不阻碍部分。 该系统包括处理智能以自动选择给定身体轮廓(例如,轮廓)信息的适当的过滤器。

    Masking fixture for a coating process
    2.
    发明授权
    Masking fixture for a coating process 有权
    用于涂层工艺的遮蔽夹具

    公开(公告)号:US08353259B2

    公开(公告)日:2013-01-15

    申请号:US11844382

    申请日:2007-08-24

    CPC classification number: B05B13/0292 B05B12/20 Y10T29/53961

    Abstract: A masking fixture for use in a coating process includes a first fixture plate for supporting a first work piece, a second fixture plate spaced from the first fixture plate for supporting a second work piece, and at least one spacer secured between the first fixture plate and the second fixture plate.

    Abstract translation: 一种用于涂覆工艺的掩模夹具包括:用于支撑第一工件的第一固定板,与第一固定板间隔开的用于支撑第二工件的第二固定板,以及固定在第一固定板和 第二个固定板。

    MASKING FIXTURE FOR A COATING PROCESS
    3.
    发明申请
    MASKING FIXTURE FOR A COATING PROCESS 有权
    涂装工艺的掩模

    公开(公告)号:US20090053422A1

    公开(公告)日:2009-02-26

    申请号:US11844382

    申请日:2007-08-24

    CPC classification number: B05B13/0292 B05B12/20 Y10T29/53961

    Abstract: A masking fixture for use in a coating process includes a first fixture plate for supporting a first work piece, a second fixture plate spaced from the first fixture plate for supporting a second work piece, and at least one spacer secured between the first fixture plate and the second fixture plate.

    Abstract translation: 一种用于涂覆工艺的掩模夹具包括:用于支撑第一工件的第一固定板,与第一固定板间隔开的用于支撑第二工件的第二固定板,以及固定在第一固定板和 第二个固定板。

    Powder port blow-off for thermal spray processes
    4.
    发明授权
    Powder port blow-off for thermal spray processes 有权
    用于热喷涂工艺的粉末喷嘴

    公开(公告)号:US07644872B2

    公开(公告)日:2010-01-12

    申请号:US11387652

    申请日:2006-03-23

    CPC classification number: B05B7/226 B05B15/555 C23C4/134

    Abstract: A powder port blow-off system for a plasma spray process includes a faceplate that includes a bore therein that is co-radially aligned with a nozzle of a plasma spray gun, which emits a plasma plume. A plurality of powder feed ports are arranged circumferentially around the nozzle for injecting a flow of powder particles toward the plasma plume. A plurality of powder port blow-offs are arranged circumferentially around the nozzle in order to direct blow-off gas across the powder feed ports. The powder port blow-offs are directed across the plasma plume to create a vortex for carrying away powder particles unconsumed by the plasma plume.

    Abstract translation: 用于等离子体喷涂工艺的粉末端口吹扫系统包括面板,其包括其中发射等离子体羽流的等离子体喷枪的喷嘴同心径向对准的孔。 多个粉末供给口围绕喷嘴周向布置,用于将粉末颗粒流注入等离子体羽流。 多个粉末端口吹扫沿周向设置在喷嘴周围,以便将吹扫气体引导穿过粉末进料口。 粉末端口吹扫被引导穿过等离子体羽流以产生用于携带未被等离子体羽流消耗的粉末颗粒的涡流。

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