Method and system for controllable deposition of nanoparticles on a substrate
    1.
    发明申请
    Method and system for controllable deposition of nanoparticles on a substrate 有权
    在衬底上可控制沉积纳米颗粒的方法和系统

    公开(公告)号:US20070111537A1

    公开(公告)日:2007-05-17

    申请号:US11360440

    申请日:2006-02-24

    IPC分类号: H01L21/31

    摘要: In a method and system for controllable electrostatic-directed deposition of nanoparticles from the gas phase on a substrate patterned to have p-n junction(s), a bias electrical field is reversely applied to the p-n junction, so that uni-polarly charged nanoparticles are laterally confined on the substrate by a balance of electrostatic, van der Waals and image forces and are deposited on a respective p-doped or n-doped regions of the p-n junction when the applied electric field reaches a predetermined strength. The novel controllable deposition of nanoparticles employs commonly used substrate architectures for the patterning of an electric field attracting or repelling nanoparticles to the substrates and offers the opportunity to create a variety of sophisticated electric field patterns which may be used to direct particles with greater precision.

    摘要翻译: 在用于在图案化为具有pn结的衬底上的气相中可控地静电导向沉积纳米颗粒的方法和系统中,偏置电场被反向施加到pn结,使得单极化带电的纳米颗粒是横向的 通过静电,范德华力和图像力的平衡限制在衬底上,并且当施加的电场达到预定强度时,沉积在pn结的相应p掺杂或n掺杂区域上。 纳米颗粒的新型可控沉积采用通常使用的衬底结构,用于将纳米颗粒吸引或排斥到衬底的电场图案化,并且提供了创建可用于以更高精度引导颗粒的各种复杂电场图案的机会。