公开(公告)号：US20090097950A1

公开(公告)日：2009-04-16

申请号：US12285777

申请日：2008-10-14

申请人： Osamu Tanaka ,  Takafumi Tsuchiya ,  Tohru Iwabae

发明人： Osamu Tanaka ,  Takafumi Tsuchiya ,  Tohru Iwabae

IPC分类号： H01L21/67

CPC分类号： H01L21/67276 ,  H01L21/67781 ,  Y10S414/137

摘要： A substrate processing system includes a control section configured to control a series of transfer operations and preset to control operation of a container transfer apparatus, operation at a substrate access area, and operation of a substrate handling apparatus independently of each other. The control section includes a schedule creating portion configured to create a transfer schedule by individually adjusting operation timing of the container transfer apparatus, operation timing at the substrate access area, and operation timing of the substrate handling apparatus such that, in a state while a first lot of substrates are treated in the processing system, but the container transfer apparatus and the substrate access area are unoccupied, a container with a second lot of unprocessed substrates stored therein is transferred onto the substrate access area, thereby making total transfer time pertinent.

摘要翻译： 基板处理系统包括：控制部，其被配置为控制一系列传送操作并预设以控制容器传送装置的操作，基板存取区域的操作以及彼此独立的基板处理装置的操作。 控制部包括：调度生成部，被配置为通过分别调整容器搬送装置的动作定时，基板通路区域的动作时刻，以及基板处理装置的动作定时来生成传送进度，使得在第一 在处理系统中处理了许多基板，但是容器传送装置和基板通路区域未被占用，其中存储有第二批未处理的基板的容器被转移到基板通路区域上，从而使总传输时间相关。

公开(公告)号：US08079797B2

公开(公告)日：2011-12-20

申请号：US12285777

申请日：2008-10-14

申请人： Osamu Tanaka ,  Takafumi Tsuchiya ,  Tohru Iwabae

发明人： Osamu Tanaka ,  Takafumi Tsuchiya ,  Tohru Iwabae

IPC分类号： B65G49/07

CPC分类号： H01L21/67276 ,  H01L21/67781 ,  Y10S414/137

摘要： A substrate processing system includes a control section configured to control a series of transfer operations and preset to control operation of a container transfer apparatus, operation at a substrate access area, and operation of a substrate handling apparatus independently of each other. The control section includes a schedule creating portion configured to create a transfer schedule by individually adjusting operation timing of the container transfer apparatus, operation timing at the substrate access area, and operation timing of the substrate handling apparatus such that, in a state while a first lot of substrates are treated in the processing system, but the container transfer apparatus and the substrate access area are unoccupied, a container with a second lot of unprocessed substrates stored therein is transferred onto the substrate access area, thereby minimizing total transfer time.

摘要翻译： 基板处理系统包括：控制部，其被配置为控制一系列传送操作并预设以控制容器传送装置的操作，基板存取区域的操作以及彼此独立的基板处理装置的操作。 控制部包括：调度生成部，被配置为通过分别调整容器搬送装置的动作定时，基板通路区域的动作时刻，以及基板处理装置的动作定时来生成传送进度，使得在第一 在处理系统中处理了许多基板，但是容器转印装置和基板存取区域未被占用，其中存储有第二批未处理的基板的容器被转移到基板存取区域上，从而最小化总转印时间。

公开(公告)号：US20100163077A1

公开(公告)日：2010-07-01

申请号：US12644673

申请日：2009-12-22

申请人： Takafumi TSUCHIYA ,  Tohru IWABAE

发明人： Takafumi TSUCHIYA ,  Tohru IWABAE

IPC分类号： B08B3/00

CPC分类号： B08B3/08 ,  B08B3/00 ,  G06Q10/06 ,  H01L21/67276 ,  H01L21/67745

摘要： Disclosed is a treating apparatus capable of improving the throughput during successive processing of target objects without a bad influence on the target objects. The disclosed treating apparatus includes an extendable liquid treating mechanism, and a common handling unit for handling one target object and another target object in order. The treating apparatus includes a recipe producing unit for producing a recipe having a rinsing liquid treatment and a common handling. When one common handling for handling one target object by the common handling unit and another common handling for handling another target object by the common handling unit are temporally overlapped with each other, the recipe producing unit extends the extendable liquid treatment for another target object, and shifts another common handling to an extent that the extendable liquid treatment is extended, thereby avoiding the temporal overlapping of one common handling with another common handling.

摘要翻译： 公开了一种处理装置，能够在目标物体的连续处理期间提高吞吐量，而不会对目标物体造成不良影响。 所公开的处理装置包括可延伸液体处理机构和用于依次处理一个目标物体和另一个目标物体的公共处理单元。 处理装置包括配方生成单元，用于生产具有冲洗液处理和共同处理的配方。 当由公共处理单元处理一个目标对象的一个​​常见处理和用于由公共处理单元处理另一个目标对象的另一个常见处理在时间上彼此重叠时，配方生成单元扩展用于另一目标对象的可扩展液体处理， 将可扩展液体处理延长的程度转移到另一种常见处理，从而避免了一种常见处理与另一种常见处理的时间重叠。

公开(公告)号：US08790469B2

公开(公告)日：2014-07-29

申请号：US12644673

申请日：2009-12-22

申请人： Takafumi Tsuchiya ,  Tohru Iwabae

发明人： Takafumi Tsuchiya ,  Tohru Iwabae

IPC分类号： B08B3/00

CPC分类号： B08B3/08 ,  B08B3/00 ,  G06Q10/06 ,  H01L21/67276 ,  H01L21/67745

摘要： Disclosed is a treating apparatus capable of improving the throughput during successive processing of target objects without a bad influence on the target objects. The disclosed treating apparatus includes an extendable liquid treating mechanism, and a common handling unit for handling one target object and another target object in order. The treating apparatus includes a recipe producing unit for producing a recipe having a rinsing liquid treatment and a common handling. When one common handling for handling one target object by the common handling unit and another common handling for handling another target object by the common handling unit are temporally overlapped with each other, the recipe producing unit extends the extendable liquid treatment for another target object, and shifts another common handling to an extent that the extendable liquid treatment is extended, thereby avoiding the temporal overlapping of one common handling with another common handling.

摘要翻译： 公开了一种处理装置，能够在目标物体的连续处理期间提高吞吐量，而不会对目标物体造成不良影响。 所公开的处理装置包括可延伸液体处理机构和用于依次处理一个目标物体和另一个目标物体的公共处理单元。 处理装置包括配方生成单元，用于生产具有冲洗液处理和共同处理的配方。 当由公共处理单元处理一个目标对象的一个​​常见处理和用于由公共处理单元处理另一个目标对象的另一个常见处理在时间上彼此重叠时，配方生成单元扩展用于另一目标对象的可扩展液体处理， 将可扩展液体处理延长的程度转移到另一种常见处理，从而避免了一种常见处理与另一种常见处理的时间重叠。