公开(公告)号：US20050177263A1

公开(公告)日：2005-08-11

申请号：US10775595

申请日：2004-02-09

Applicant: Topas Chang ,  Hsin Wang ,  Chieh Chang ,  Chuan Chiu ,  Pei-Wei Kuo

Inventor： Topas Chang ,  Hsin Wang ,  Chieh Chang ,  Chuan Chiu ,  Pei-Wei Kuo

IPC: G06F19/00 ,  G06Q10/00

CPC classification number: G06Q10/06 ,  G05B2219/32196 ,  Y02P90/22

Abstract: A system for monitoring wafer throughput per hour in a wafer furnace includes a database, an analysis unit, a comparison unit, and an output unit. The database includes two or more operation histories of the wafer furnace. The analysis unit is coupled to the database. The analysis unit includes logic that retrieves at least one operation history from the database, determines a standard process time and a specification range for the retrieved operation history, and receives a current process time for the current process. The comparison unit, which is coupled to the analysis unit, includes logic that compares the standard process time and the specification range to the current process time. The output unit, which is coupled to the comparison unit, includes logic that outputs a comparison result. A method for monitoring wafer throughput per hour in a wafer furnace also is described.

Abstract translation: 用于监测晶片炉中每小时的晶片产量的系统包括数据库，分析单元，比较单元和输出单元。 该数据库包括晶圆炉的两个或多个操作历史。 分析单元耦合到数据库。 分析单元包括从数据库检索至少一个操作历史的逻辑，确定标准处理时间和检索的操作历史的规格范围，并且接收当前处理的当前处理时间。 耦合到分析单元的比较单元包括将标准处理时间和规格范围与当前处理时间进行比较的逻辑。 耦合到比较单元的输出单元包括输出比较结果的逻辑。 还描述了一种用于监测晶片炉中每小时的晶片产量的方法。

公开(公告)号：US07151975B2

公开(公告)日：2006-12-19

申请号：US10775595

申请日：2004-02-09

Applicant: Topas Chang ,  Hsin Ten Wang ,  Chieh Chung Chang ,  Chuan Hua Chiu ,  Pei-Wei Kuo

Inventor： Topas Chang ,  Hsin Ten Wang ,  Chieh Chung Chang ,  Chuan Hua Chiu ,  Pei-Wei Kuo

IPC: G06F11/30 ,  G06F19/00

CPC classification number: G06Q10/06 ,  G05B2219/32196 ,  Y02P90/22

Abstract: A system for monitoring wafer throughput per hour in a wafer furnace includes a database, an analysis unit, a comparison unit, and an output unit. The database includes two or more operation histories of the wafer furnace. The analysis unit is coupled to the database. The analysis unit includes logic that retrieves at least one operation history from the database, determines a standard process time and a specification range for the retrieved operation history, and receives a current process time for the current process. The comparison unit, which is coupled to the analysis unit, includes logic that compares the standard process time and the specification range to the current process time. The output unit, which is coupled to the comparison unit, includes logic that outputs a comparison result. A method for monitoring wafer throughput per hour in a wafer furnace also is described.

Abstract translation: 用于监测晶片炉中每小时的晶片产量的系统包括数据库，分析单元，比较单元和输出单元。 该数据库包括晶圆炉的两个或多个操作历史。 分析单元耦合到数据库。 分析单元包括从数据库检索至少一个操作历史的逻辑，确定标准处理时间和检索的操作历史的规格范围，并且接收当前处理的当前处理时间。 耦合到分析单元的比较单元包括将标准处理时间和规格范围与当前处理时间进行比较的逻辑。 耦合到比较单元的输出单元包括输出比较结果的逻辑。 还描述了一种用于监测晶片炉中每小时的晶片产量的方法。