专利检索 ap:"Toru Hirabayashi" 第 1 页

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发明授权
Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method 失效
标题翻译：曝光装置，气体置换方法，半导体装置制造方法，半导体制造厂和曝光装置的维修方法

公开(公告)号：US06714277B2

公开(公告)日：2004-03-30

申请号：US09818625

申请日：2001-03-28

申请人： Shinichi Hara , Yutaka Tanaka , Kazuyuki Kasumi , Toru Hirabayashi

发明人： Shinichi Hara , Yutaka Tanaka , Kazuyuki Kasumi , Toru Hirabayashi

IPC分类号： G03B2752

CPC分类号： G03F7/70058 , G03F7/70775 , G03F7/70841 , G03F7/70883 , G03F7/70933

摘要： An exposure apparatus includes a chamber which incorporates an optical element and surrounds a predetermined region, a mechanism for setting an inert gas atmosphere in the chamber, and a closed vessel which surrounds the chamber. The purity of inert gas in the chamber is higher than a purity of inert gas in the closed vessel.

摘要翻译： 曝光装置包括包含光学元件并围绕预定区域的腔室，用于设置腔室中的惰性气体气氛的机构和围绕腔室的封闭容器。室内惰性气体的纯度高于密闭容器中惰性气体的纯度。