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    Actuation system and lithographic apparatus
    1.
    发明授权
    Actuation system and lithographic apparatus 有权

    公开(公告)号：US09748682B2

    公开(公告)日：2017-08-29

    申请号：US14601276

    申请日：2015-01-21

    申请人： ASML Netherlands B.V.

    发明人： Johannes Wilhelmus Damen ,  Martinus Jacobus Coenen ,  Hermannus Antonius Langeler

    IPC分类号： H01R9/03 ,  H01R13/02 ,  G03B27/54 ,  G03F7/20

    CPC分类号： H01R13/02 ,  G03B27/54 ,  G03F7/70758 ,  G03F7/70841 ,  G03F7/70991

    摘要： Actuation systems and lithographic apparatus which address the issue of uncontrolled return of common mode currents are provided. In an embodiment such systems aim to prevent the occurrence of corona and discharge between high voltage electric cables in low pressure environments. An exemplary actuation system includes an actuator module, a power source and power transmission cables. The actuator module includes an electrical motor and a first plurality of shielded cables configured to connect to the electrical motor at one end. The actuator module is located in a low pressure environment and each shield of the first plurality of cables is grounded. The transmission cables electrically connect the first plurality of cables with power supply, and include an extra cable configured to connect each shield of the first plurality of cables with the first extra cable, via a choke so as to provide a return path for common-mode currents.

    VACUUM LINEAR FEED-THROUGH AND VACUUM SYSTEM HAVING SAID VACUUM LINEAR FEED-THROUGH
    2.
    发明申请
    VACUUM LINEAR FEED-THROUGH AND VACUUM SYSTEM HAVING SAID VACUUM LINEAR FEED-THROUGH 有权

    公开(公告)号：US20170212428A1

    公开(公告)日：2017-07-27

    申请号：US15481619

    申请日：2017-04-07

    申请人： Carl Zeiss SMT GmbH

    发明人： Matthias Roos ,  Eugen Foca

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70708 ,  G03F7/70841 ,  G03F7/70916 ,  H01J2237/022 ,  H01J2237/2006 ,  H01J2237/20221

    摘要： A vacuum linear feed-through (20), e.g., for an EUV lithography system, includes: a vacuum diaphragm bellows (21), which has a first end (21a) attaching a component and a second end (21b), opposite the first end, attaching to a vacuum housing, and an actuator device (27) generating a linear reciprocating motion of the bellows. The feed-through has at least one first shield (30, 30′), connected to the bellows at the first end, and at least one second shield (31, 31′), connected to the bellows at the second end. The first and second shield annularly surround the bellows, and the first and second shield overlap in the longitudinal direction of the bellows (21). At least one first shield and at least one second shield are formed of a permanently magnetic material, and/or the feed-through has a voltage-generating device (33) generating an electric field (E) between the first shield and the second shield.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20170052463A1

    公开(公告)日：2017-02-23

    申请号：US15306982

    申请日：2015-03-17

    申请人： ASML NETHERLANDS B.V.

    发明人： Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Martijn VAN BAREN

    IPC分类号： G03F7/20 ,  H01L21/67 ,  H01L21/677

    CPC分类号： G03F7/70875 ,  G03F7/7075 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  H01L21/67 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67265 ,  H01L21/67742

    摘要： A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

    摘要翻译： 一种基板处理系统，包括：热屏蔽件，用于将基板通过的空间从发生在该空间外部的热负载热绝缘，所述热屏蔽包括：第一壁和第二壁，其间具有间隙，所述第一壁定位 在空间和第二个墙之间; 入口开口，其构造成允许来自气体源的气体流从所述空间外部进入所述间隙; 以及出口开口，其构造成允许气体流动离开所述间隙到所述空间的外部，其中所述系统被配置为引导气体流通过所述入口开口进入所述间隙，以流过所述间隙并离开所述间隙 通过出口开口到空间外部的间隙，由此由于源自空间外的热负荷而减小空间中的热波动。

    VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY
    6.
    发明申请
    VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY 有权
    真空曝光系统

    公开(公告)号：US20140362358A1

    公开(公告)日：2014-12-11

    申请号：US14469389

    申请日：2014-08-26

    申请人： ASML NETHERLANDS B.V.

    发明人： Andrew John HARPHAM ,  Paul John SHECHTER ,  Paul Alan STOCKMAN

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70841

    摘要： A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.

    摘要翻译： 用于从光刻工具提取多相流体流的真空系统包括用于从工具抽取流体的泵送装置和位于泵送装置上游的抽出罐，用于将从工具拉出的流体分离成 气相和液相。 泵送装置包括用于从罐中提取气体的第一泵和用于从罐中提取液体的第二泵。 为了最小化从真空系统传回到工具内的流体的任何压力波动，压力控制系统通过调节罐内的液体和气体的量来保持罐中基本恒定的压力。

    Vacuum system for immersion photolithography
    7.
    发明授权
    Vacuum system for immersion photolithography 有权
    浸没式光刻真空系统

    公开(公告)号：US08830440B2

    公开(公告)日：2014-09-09

    申请号：US13187166

    申请日：2011-07-20

    申请人： Andrew John Harpham ,  Paul John Shechter ,  Paul Alan Stockman

    发明人： Andrew John Harpham ,  Paul John Shechter ,  Paul Alan Stockman

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70841

    摘要： A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.

    摘要翻译： 用于从光刻工具提取多相流体流的真空系统包括用于从工具中抽取流体的泵送装置和位于泵送装置上游的抽吸罐，用于将从工具抽出的流体分离成气体和 液相。 泵送装置包括用于从罐中提取气体的第一泵和用于从罐中提取液体的第二泵。 为了最小化从真空系统传回到工具内的流体的任何压力波动，压力控制系统通过调节罐内的液体和气体的量来保持罐中基本恒定的压力。

    Operating valve, exposure apparatus, and device manufacturing method
    9.
    发明授权
    Operating valve, exposure apparatus, and device manufacturing method 有权
    操作阀，曝光装置和装置制造方法

    公开(公告)号：US08319947B2

    公开(公告)日：2012-11-27

    申请号：US12574333

    申请日：2009-10-06

    申请人： Hiroyuki Eki ,  Shiro Sakai

    发明人： Hiroyuki Eki ,  Shiro Sakai

    IPC分类号： B23B31/30 ,  B65G1/133 ,  F16K1/00 ,  G03B27/58 ,  G03B27/60 ,  G03B27/62

    CPC分类号： F16K51/02 ,  G03F7/707 ,  G03F7/70841 ,  Y10T29/49 ,  Y10T279/11

    摘要： An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening which is provided at an exhaust side for exhausting an air from an inside to an outside and is opposed to a suction side for sucking the air from the outside to the inside, a valve 8, and a spring 9 whose one end is connected with one of the suction side and the exhaust side of the body 4 and the other end is connected with the valve 8. The spring 9 is configured to stretch or compress in accordance with a differential pressure between the suction side and the exhaust side, and the valve 8 is provided with at least one hole.

    摘要翻译： 本发明的操作阀是用于对基板进行真空抽吸的压差操作阀100，操作阀包括一个主体4，该主体4具有设置在排气侧的开口，用于从内部向外部排出空气 并且与吸入侧相对，用于从外部向内部吸入空气，阀8和弹簧9，其一端与主体4的吸入侧和排气侧中的一个连接，另一端为 与阀8连接。弹簧9构造成根据吸力侧和排气侧之间的压差拉伸或压缩，并且阀8设置有至少一个孔。

    Differential evacuation system
    10.
    发明授权
    Differential evacuation system 有权
    差分疏散系统

    公开(公告)号：US08258492B2

    公开(公告)日：2012-09-04

    申请号：US12631258

    申请日：2009-12-04

    申请人： Hiroshi Someya ,  Yukio Watanabe

    发明人： Hiroshi Someya ,  Yukio Watanabe

    IPC分类号： G21G5/00

    CPC分类号： G03F7/70841 ,  G03F7/70033 ,  G03F7/70808 ,  H05G2/003 ,  H05G2/008

    摘要： [Technical Problem] To provide a differential evacuation system capable of easily maintaining, at a low cost, a large differential pressure between a light generation chamber and an illumination optical chamber in which optical processing, e.g. exposure, is performed by using extreme ultraviolet (EUV) light generated in the light generation chamber, and yet capable of sufficiently ensuring a desired optical path.[Solution to Problem] The differential evacuation system has a light generation chamber 10 that generates EUV light, an illumination optical chamber 100 in which optical processing is performed by using the EUV light generated in the light generation chamber 10, and a chamber connecting passage 150 that connects together the light generation chamber 10 and the illumination optical chamber 100 to guide the EUV light generated in the light generation chamber 10 into the illumination optical chamber 100. The chamber connecting passage 150 has a flow path constricting portion 151 and is increased in inner diameter in a conical tube shape at portions thereof that are at opposite sides, respectively, of the flow path constricting portion 151. An enlarged-diameter part 160 is provided at a position of the chamber connecting passage 150 that is closer to the light generation chamber 10, which is the higher in pressure of the two chambers 10 and 100, than the flow path constricting portion 151, and vacuum pumps 170 are attached to the enlarged-diameter part 160.

    摘要翻译： 技术问题提供一种能够以低成本容易地维持光生成室和照明光学室之间的大的压差的差分抽空系统，其中光学处理，例如， 曝光是通过使用在光产生室中产生的极紫外（EUV）光进行的，并且能够充分确保期望的光路。 [问题的解决方案]差分抽空系统具有产生EUV光的光生成室10，通过使用在光生成室10中产生的EUV光进行光学处理的照明光学室100和室连接通路150 将光生成室10和照明光学室100连接在一起，将发光室10内产生的EUV光引导到照明光学室100中。室连通路150具有流路收缩部151，内部增大 直径在分别位于流路收缩部151的相对侧的部分处的锥形管形状。扩径部160设置在室连接通道150的靠近光生成室的位置 如图10所示，两个腔室10和100的压力比流路收缩部分151高， 并且真空泵170附接到扩径部160。