公开(公告)号：USRE42248E1

公开(公告)日：2011-03-29

申请号：US12411838

申请日：2009-03-26

申请人： Toshiko Hosoda ,  Shinichi Yotsuya

发明人： Toshiko Hosoda ,  Shinichi Yotsuya

IPC分类号： B08B3/04

CPC分类号： B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.

摘要翻译： 附着于低分子量有机EL元件的气相沉积掩模的有机物质的清洗装置包括用吡咯烷酮衍生物处理气相沉积掩模的第一阶段，用水冲洗蒸镀掩模的第二阶段， 以及用流水冲洗蒸镀掩模的第三阶段。 清洗装置还包括用乙醇处理气相沉积掩模的第四阶段，用于干燥气相沉积掩模的第五阶段，以及将蒸镀掩模依次运送到每个阶段的承载装置。 采用N-甲基-2-吡咯烷酮作为吡咯烷酮的衍生物是理想的。

公开(公告)号：US07459029B2

公开(公告)日：2008-12-02

申请号：US11001498

申请日：2004-12-01

申请人： Toshiko Hosoda ,  Shinichi Yotsuya

发明人： Toshiko Hosoda ,  Shinichi Yotsuya

IPC分类号： B08B3/04

CPC分类号： B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.

摘要翻译： 附着于低分子量有机EL元件的气相沉积掩模的有机物质的清洗装置包括用吡咯烷酮衍生物处理气相沉积掩模的第一阶段，用水冲洗蒸镀掩模的第二阶段， 以及用流水冲洗蒸镀掩模的第三阶段。 清洗装置还包括用乙醇处理气相沉积掩模的第四阶段，用于干燥气相沉积掩模的第五阶段，以及将蒸镀掩模依次运送到每个阶段的承载装置。 采用N-甲基-2-吡咯烷酮作为吡咯烷酮的衍生物是理想的。

公开(公告)号：US20070222367A1

公开(公告)日：2007-09-27

申请号：US11672389

申请日：2007-02-07

申请人： Toshiko Hosoda ,  Shinichi Yotsuya

发明人： Toshiko Hosoda ,  Shinichi Yotsuya

IPC分类号： H05B33/00 ,  H01L51/50 ,  B05D5/12

CPC分类号： H01L27/3213 ,  H01L27/3244

摘要： A process for producing an emissive device including a first emissive layer composed of a first material that emits light of a first color, a second emissive layer composed of a second material that emits light of a second color different from the first color, and a third emissive layer that emits light of a third color by stacking at least the first material and the second material, the third color being different from both of the first color and the second color, the process includes (1) feeding the first material to a side adjacent to a first face of at least one first electrode by a gas-phase process with a first mask to form films, the first mask having an opening for forming the first emissive layer and having an opening for forming the third emissive layer; (2) feeding the second material to the side adjacent to the first face of each first electrode by a gas-phase process to form the emissive layers while a second mask having an opening for forming the second emissive layer and having an opening for forming the third emissive layer is positioned in such a manner that the position of each film to be the third emissive layer is substantially identical to the position of the opening for forming the third emissive layer; and (3) forming a second electrode at a side of each emissive layer opposite the side adjacent to the first electrode.

摘要翻译： 一种发光装置的制造方法，其包括由发射第一颜色的光的第一材料构成的第一发光层，由发射不同于第一颜色的第二颜色的光的第二材料构成的第二发光层，以及第三发光层 至少通过堆叠第一材料和第二材料来发射第三颜色的光的发光层，第三颜色不同于第一颜色和第二颜色两者，该处理包括（1）将第一材料馈送到侧面 通过与第一掩模的气相工艺相邻于至少一个第一电极的第一面以形成膜，所述第一掩模具有用于形成第一发射层并具有用于形成第三发射层的开口的开口; （2）通过气相工艺将第二材料供给到与每个第一电极的第一面相邻的一侧，以形成发光层，而具有用于形成第二发射层的开口的第二掩模具有用于形成发光层的开口 第三发光层以这样的方式定位，使得作为第三发射层的每个膜的位置基本上与用于形成第三发射层的开口的位置相同; 和（3）在每个发光层的与第一电极相邻的一侧相反的一侧形成第二电极。

公开(公告)号：US07819717B2

公开(公告)日：2010-10-26

申请号：US11672389

申请日：2007-02-07

申请人： Toshiko Hosoda ,  Shinichi Yotsuya

发明人： Toshiko Hosoda ,  Shinichi Yotsuya

IPC分类号： H01J9/24

CPC分类号： H01L27/3213 ,  H01L27/3244

摘要： A process for producing an emissive device that includes (1) feeding the first material to the first region and the third region and to a side adjacent to a first face of at least one first electrode by a gas-phase process with a first mask to form films; (2) feeding the second material to the second region and the third region such that the second material fed in the third region is stacked above the first material in the third region and to the side adjacent to the first face of each first electrode by a gas-phase process to form the emissive layers; and (3) forming a second electrode at a side of each emissive layer opposite the side adjacent to the first electrode.

摘要翻译： 一种用于制造发射器件的方法，其包括（1）通过气相法将第一材料馈送到第一区域和第三区域以及与至少一个第一电极的第一面相邻的一侧，其中第一掩模与 形成电影; （2）将所述第二材料供给到所述第二区域和所述第三区域，使得在所述第三区域中供给的所述第二材料在所述第三区域中堆叠在所述第一材料的上方并且与所述第一电极的所述第一面相邻的一侧层叠 气相工艺形成发光层; 和（3）在每个发光层的与第一电极相邻的一侧相反的一侧形成第二电极。

公开(公告)号：US20050115594A1

公开(公告)日：2005-06-02

申请号：US11001498

申请日：2004-12-01

申请人： Toshiko Hosoda ,  Shinichi Yotsuya

发明人： Toshiko Hosoda ,  Shinichi Yotsuya

IPC分类号： B08B3/08 ,  B08B3/00 ,  B08B3/12 ,  C23C14/04 ,  C23C14/24 ,  H01L21/302 ,  H01L21/44 ,  H01L21/461 ,  H01L51/50 ,  H05B33/10 ,  H05B33/14

CPC分类号： B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.

摘要翻译： 附着于低分子量有机EL元件的气相沉积掩模的有机物质的清洗装置包括用吡咯烷酮衍生物处理气相沉积掩模的第一阶段，用水冲洗蒸镀掩模的第二阶段， 以及用流水冲洗蒸镀掩模的第三阶段。 清洗装置还包括用乙醇处理气相沉积掩模的第四阶段，用于干燥气相沉积掩模的第五阶段，以及将蒸镀掩模依次运送到各个阶段的承载装置。 采用N-甲基-2-吡咯烷酮作为吡咯烷酮的衍生物是理想的。