公开(公告)号：US5183533A

公开(公告)日：1993-02-02

申请号：US599782

申请日：1990-10-17

Applicant: Michinari Tsutsumi ,  Atsushi Endo ,  Toshio Yada

Inventor： Michinari Tsutsumi ,  Atsushi Endo ,  Toshio Yada

IPC: C23F1/02 ,  C23F1/26 ,  H01L21/3213

CPC classification number: C23F1/26 ,  C23F1/02 ,  H01L21/32134 ,  H01L21/32139

Abstract: A method for etching a chromium film includes the steps of forming a resist having a phenol novolak resin as a principal chain on the chromium film formed on a substrate, and etching the chromium film using an etchant while stripping off the resist from the chromium film using an etchant containing nitric acid. A second method for etching a chromium film includes the steps of forming an aluminum film or an aluminum alloy film on the chromium film formed on a substrate, forming a resist having a predetermined pattern on the aluminum film or the aluminum alloy film, etching the aluminum film or the aluminum alloy film and the chromium film using phosphoric acid, and removing by etching the aluminum film or the aluminum alloy film using phosphoric acid containing nitric acid after removing the resist.

Abstract translation: 蚀刻铬膜的方法包括以下步骤：在基材上形成的铬膜上形成具有苯酚酚醛清漆树脂作为主链的抗蚀剂，并使用蚀刻剂蚀刻铬膜，同时用铬膜剥离抗蚀剂，使用 含有硝酸的蚀刻剂。 蚀刻铬膜的第二种方法包括在形成在基板上的铬膜上形成铝膜或铝合金膜的步骤，在铝膜或铝合金膜上形成具有预定图案的抗蚀剂，蚀刻铝 膜或铝合金膜和使用磷酸的铬膜，并且在除去抗蚀剂之后通过使用含有硝酸的磷酸蚀刻铝膜或铝合金膜除去。

公开(公告)号：US5007984A

公开(公告)日：1991-04-16

申请号：US249905

申请日：1988-09-27

Applicant: Michinari Tsutsumi ,  Atsushi Endo ,  Toshio Yada

Inventor： Michinari Tsutsumi ,  Atsushi Endo ,  Toshio Yada

IPC: C23F1/02 ,  C23F1/26 ,  H01L21/3213

CPC classification number: C23F1/26 ,  C23F1/02 ,  H01L21/32134 ,  H01L21/32139

Abstract: A method for etching a chromium film includes the steps of forming a resist having a phenol novolak resin as a principal chain on the chromium film formed on a substrate, and etching the chromium film using an etchant while stripping off the resist from the chromium film using an etchant containing nitric acid. A second method for etching a chromium film comprises the steps of forming an aluminum film or an aluminum alloy film on the chromium film formed on a substrate, forming a resist having a predetermined pattern on the aluminum film or the aluminum alloy film, etching the aluminum film or the aluminum alloy film and the chromium film using phosphoric acid, and removing by etching the aluminum film or the aluminum alloy film using phosphoric acid containing nitric acid after removing the resist.

Abstract translation: 蚀刻铬膜的方法包括以下步骤：在基材上形成的铬膜上形成具有苯酚酚醛清漆树脂作为主链的抗蚀剂，并使用蚀刻剂蚀刻铬膜，同时用铬膜剥离抗蚀剂，使用 含有硝酸的蚀刻剂。 用于蚀刻铬膜的第二种方法包括以下步骤：在形成在基底上的铬膜上形成铝膜或铝合金膜，在铝膜或铝合金膜上形成具有预定图案的抗蚀剂，蚀刻铝 膜或铝合金膜和使用磷酸的铬膜，并且在除去抗蚀剂之后通过使用含有硝酸的磷酸蚀刻铝膜或铝合金膜除去。

公开(公告)号：US07092994B2

公开(公告)日：2006-08-15

申请号：US10064793

申请日：2002-08-16

Applicant: Takeshi Nishio ,  Akio Ogasawara ,  Toshio Yada

Inventor： Takeshi Nishio ,  Akio Ogasawara ,  Toshio Yada

IPC: G06F15/16

CPC classification number: H04L51/28

Abstract: The e-mail system includes a responsible person terminal holding a plurality of recipient addresses to which given e-mail is sent, and a reference list editor terminal connected to the responsible person terminal through a network for editing a reference list comprising one or more recipient addresses to be updated from among the recipient addresses. The reference list includes recipient addresses to be replaced, recipient addresses to be deleted, and recipient addresses to be added. The reference list end a program or tool that references the reference list to update an e-mail recipient address list are recorded/stored on a server. The reference list editor terminal and the responsible person terminal access the server to cause the update function to be performed.

Abstract translation: 该电子邮件系统包括一个负责人的终端，该终端保存有给定电子邮件的多个收件人地址，以及参考列表编辑器终端，通过网络连接到负责人终端，用于编辑包括一个或多个接收者的参考列表 收件人地址中要更新的地址。 参考列表包括要替换的收件人地址，要删除的收件人地址和要添加的收件人地址。 引用列表结束引用参考列表以更新电子邮件收件人地址列表的程序或工具被记录/存储在服务器上。 引用列表编辑器终端和负责人终端访问服务器以执行更新功能。

公开(公告)号：US4875434A

公开(公告)日：1989-10-24

申请号：US176864

申请日：1988-04-01

Applicant: Taro Maejima ,  Toshio Yada ,  Michinari Tsutsumi ,  Tsuyoshi Tabuchi ,  Takeshi Terazono ,  Masaru Aoki

Inventor： Taro Maejima ,  Toshio Yada ,  Michinari Tsutsumi ,  Tsuyoshi Tabuchi ,  Takeshi Terazono ,  Masaru Aoki

IPC: B05C11/08 ,  C23C26/00 ,  G03F7/16 ,  B05C1/02 ,  B05C3/09 ,  B05C7/06

CPC classification number: B05C11/08 ,  C23C26/00 ,  G03F7/162

Abstract: An apparatus for coating the flat surface of a substrate with a coating material is disclosed in which only a minimum amount of coating material is required for uniformly coating the entire surface of the substrate in an efficient manner under a variety of coating conditions, even if the substrate surface takes a non-circular configuration. According to one embodiment, the flat surface of the substrate is first coated with a coating material, and the substrate thus coated is then spunned at predetermined number of revolutions per minute. According to another embodiment, the apparatus includes a support table on which the substrate is fixedly mounted. A plurality of shaping members are slidably mounted on the support table for forming with the flat non-circular-shaped surface of the substrate a flat continuously extending circular-shaped surface. A plurality of biasing members are provided one for each shaping member for biasing the shaping members radially inwards into intimate contact at their inner sides with the peripheral side surfaces of the substrate mounted on the support table. A plurality of level adjusting mechanisms are provided on the shaping members for adjusting the surface of the shaping members to be flush with the flat surface of the substrate.

Abstract translation: 公开了一种用涂料涂覆基材的平坦表面的设备，其中在各种涂布条件下，仅有最少量的涂料需要以有效的方式均匀地涂布在基材的整个表面上，即使 衬底表面采取非圆形构造。 根据一个实施方案，首先用涂料涂覆基材的平坦表面，然后以每分钟预定的转数将所涂覆的基材进行旋转。 根据另一个实施例，该装置包括支撑台，基座固定在该支撑台上。 多个成形构件可滑动地安装在支撑台上，用于与基板的平坦的非圆形表面形成平坦的连续延伸的圆形表面。 为每个成形构件设置多个偏置构件，用于将成形构件径向向内偏压成在其内侧紧密接触，并将基板的周边侧表面安装在支撑台上。 在成形构件上设置有多个水平调节机构，用于调整成形构件的表面以与衬底的平坦表面齐平。