Polyethylene Composition Suitable for Film Applications and Films Made Therefrom
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    发明申请
    Polyethylene Composition Suitable for Film Applications and Films Made Therefrom 审中-公开
    聚乙烯组合物适用于薄膜应用和薄膜

    公开(公告)号:US20150284523A1

    公开(公告)日:2015-10-08

    申请号:US14443435

    申请日:2013-11-19

    IPC分类号: C08J5/18

    摘要: The instant invention provides a polyethylene composition suitable for film applications and film made therefrom. The linear low density polyethylene composition suitable for film applications according to the present invention comprises: less than or equal to 100 percent by weight of the units derived from ethylene; and less than 35 percent by weight of units derived from one or more α-olefin comonomers; wherein said linear low density polyethylene composition has a density in the range of from 0.890 to 0.915 g/cm3, a molecular weight distribution (Mw/Mn) in the range of from 2.5 to 4.5, a melt index (12) in the range of from 2 to 10 g/10 minutes, a molecular weight distribution (Mz/Mw) in the range of from 2.2 to 3, vinyl unsaturation of less than 0.1 vinyls per one thousand carbon atoms present in the backbone of said composition, and a zero shear viscosity ratio (ZSVR) in the range from 1 to 1.2.

    摘要翻译: 本发明提供了适用于薄膜应用的聚乙烯组合物和由其制成的薄膜。 适用于根据本发明的膜应用的线性低密度聚乙烯组合物包含:小于或等于100重量%的衍生自乙烯的单元; 和少于35重量%的衍生自一种或多种α-烯烃共聚单体的单元; 其中所述线性低密度聚乙烯组合物的密度范围为0.890至0.915g / cm3,分子量分布(Mw / Mn)在2.5至4.5的范围内,熔体指数(12)在 2至10g / 10分钟,存在于所述组合物的骨架中的每1000个碳原子的分子量分布(Mz / Mw)在2.2至3的范围内,乙烯基不饱和度小于0.1个乙烯基,并且零 剪切粘度比(ZSVR)在1〜1​​.2的范围内。