Process for production of polymer sheet and optical polymer sheet
    8.
    发明授权
    Process for production of polymer sheet and optical polymer sheet 失效
    生产聚合物片和光学聚合物片的方法

    公开(公告)号:US06592802B1

    公开(公告)日:2003-07-15

    申请号:US10089216

    申请日:2002-03-26

    IPC分类号: B29C3508

    摘要: The present invention provides a process for continuously producing a polymer sheet having an excellent surface smoothness, an apparatus for producing such a polymer sheet, and an optical polymer sheet produced by such a process. The process for producing a polymer sheet comprises coating or laminating, on a polymer base sheet, an ultraviolet-curing resin composition, adhering the coated or laminated polymer base sheet to a member having a smooth surface whose maximum surface roughness (Rmax) satisfies Rmax≦0.1 &mgr;m, in a state that the ultraviolet-curing resin composition is soft, and applying an ultraviolet light to transfer smoothness of the smooth surface of the member onto the polymer base sheet.

    摘要翻译: 本发明提供了一种连续制备具有优异表面平滑度的聚合物片材的方法,用于制备这种聚合物片材的装置以及通过这种方法生产的光学聚合物片材。 制造聚合物片的方法包括在聚合物基片上涂布或层压紫外线固化树脂组合物,将涂覆或层压的聚合物基片粘附到具有最大表面粗糙度(Rmax)满足Rmax < 在紫外线固化树脂组合物柔软的状态下,施加紫外光以使构件的光滑表面的平滑度转移到聚合物基片上。

    Superconductive device manufacturing method
    10.
    发明授权
    Superconductive device manufacturing method 失效
    超导体制造方法

    公开(公告)号:US5904861A

    公开(公告)日:1999-05-18

    申请号:US622301

    申请日:1996-03-25

    IPC分类号: H01L39/24 C23F1/00

    CPC分类号: H01L39/2467

    摘要: A superconductive device manufacturing method is disclosed, which can prevent the characteristic deterioration on the processed surface, reduce the number of process steps, and thereby shorten the manufacturing time. The superconductive device manufacturing method comprises the steps of: forming a YBCO film (301) on a substrate (201); forming a mask pattern (302) on the formed YBCO film (301); and etching the YBCO film (301) by use of the formed mask pattern (302) and a plasma including at least oxygen plasma.

    摘要翻译: 公开了一种可以防止加工面的特性劣化,减少加工工序数量,从而缩短制造时间的超导体制造方法。 超导器件制造方法包括以下步骤:在衬底(201)上形成YBCO膜(301); 在形成的YBCO膜(301)上形成掩模图案(302); 以及通过使用形成的掩模图案(302)和至少包括氧等离子体的等离子体来蚀刻YBCO膜(301)。