公开(公告)号：US08333882B2

公开(公告)日：2012-12-18

申请号：US11598789

申请日：2006-11-14

申请人： Unkai Sato ,  Koichiro Ichikawa ,  Yoshinobu Nishimoto ,  Yoshio Nakamura ,  Tsuyoshi Hasegawa ,  Masumi Iihama

发明人： Unkai Sato ,  Koichiro Ichikawa ,  Yoshinobu Nishimoto ,  Yoshio Nakamura ,  Tsuyoshi Hasegawa ,  Masumi Iihama

IPC分类号： C25F3/30

CPC分类号： C09G1/02 ,  B24B37/044 ,  B24B57/02 ,  Y02E60/366

摘要： The method of polishing a work is capable of reducing a polishing cost, polishing a surface of the work with high polishing accuracy and easily disposing used polishing liquid and used washing liquid. The method comprises the steps of: pressing the work onto a polishing member; feeding polishing liquid; and relatively moving the work with respect to the polishing member. Electrolytic reduced water produced by electrolyzing an electrolyte solution is used as the polishing liquid.

摘要翻译： 抛光工件的方法能够降低抛光成本，以高抛光精度抛光工件的表面，并且容易地布置使用过的抛光液和使用的洗涤液。 该方法包括以下步骤：将工件压在抛光件上; 进料抛光液; 并且相对于抛光构件相对移动工件。 电解电解液产生的电解还原水用作研磨液。

公开(公告)号：US20070108067A1

公开(公告)日：2007-05-17

申请号：US11598789

申请日：2006-11-14

申请人： Unkai Sato ,  Koichiro Ichikawa ,  Yoshinobu Nishimoto ,  Yoshio Nakamura ,  Tsuyoshi Hasegawa ,  Masumi Iihama

发明人： Unkai Sato ,  Koichiro Ichikawa ,  Yoshinobu Nishimoto ,  Yoshio Nakamura ,  Tsuyoshi Hasegawa ,  Masumi Iihama

IPC分类号： B23H5/00

CPC分类号： C09G1/02 ,  B24B37/044 ,  B24B57/02 ,  Y02E60/366

摘要： The method of polishing a work is capable of reducing a polishing cost, polishing a surface of the work with high polishing accuracy and easily disposing used polishing liquid and used washing liquid. The method comprises the steps of: pressing the work onto a polishing member; feeding polishing liquid; and relatively moving the work with respect to the polishing member. Electrolytic reduced water produced by electrolyzing an electrolyte solution is used as the polishing liquid.

摘要翻译： 抛光工件的方法能够降低抛光成本，以高抛光精度抛光工件的表面，并且容易地布置使用过的抛光液和使用的洗涤液。 该方法包括以下步骤：将工件压在抛光件上; 进料抛光液; 并且相对于抛光构件相对移动工件。 电解电解液产生的电解还原水用作研磨液。