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公开(公告)号：US20080175297A1
公开(公告)日：2008-07-24
申请号：US12012568
申请日：2008-02-04
CPC分类号： H01S3/20 , H01S3/095 , H01S3/2215
摘要： A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.
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公开(公告)号：US07379487B2
公开(公告)日：2008-05-27
申请号：US11057539
申请日：2005-02-14
CPC分类号： H01S3/20 , H01S3/095 , H01S3/2215
摘要： A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.
摘要翻译： 两相反应器包括液体反应物源和气体反应物源。 腔室具有连接到气体反应物源的入口和连接到液体反应物源的扁平喷嘴。
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公开(公告)号：US20130175715A1
公开(公告)日：2013-07-11
申请号：US13658818
申请日：2012-10-24
IPC分类号： H01S3/20
CPC分类号： H01S3/20 , H01S3/095 , H01S3/2215
摘要： A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.
摘要翻译： 二相反应器包括液体反应物源和气体反应物源。 腔室具有连接到气体反应物源的入口和连接到液体反应物源的扁平喷嘴。
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公开(公告)号：US07871063B2
公开(公告)日：2011-01-18
申请号：US12012568
申请日：2008-02-04
CPC分类号： H01S3/20 , H01S3/095 , H01S3/2215
摘要： A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.
摘要翻译： 两相反应器包括液体反应物源和气体反应物源。 腔室具有连接到气体反应物源的入口和连接到液体反应物源的扁平喷嘴。
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