公开(公告)号：US06300047B1

公开(公告)日：2001-10-09

申请号：US09576522

申请日：2000-05-23

申请人： Wilma Massucco ,  Domenico Marinelli ,  Piero Cavalleri

发明人： Wilma Massucco ,  Domenico Marinelli ,  Piero Cavalleri

IPC分类号： G03C1825

CPC分类号： G03C1/83 ,  G03C1/74 ,  G03C1/7614 ,  G03C1/825 ,  G03C7/3029 ,  G03C2200/27 ,  G03C2200/35 ,  Y10T428/24942 ,  Y10T428/31504 ,  Y10T428/31768

摘要： The present invention relates to a support base for light-sensitive photographic elements. In particular, the present invention relates to a support base comprising a support having coated thereon at least two antihalation layers overcoated by a protective layer. The support base for light-sensitive photographic elements of the present invention presents an improved coating quality with a reduced formation of mottle, defined as an irregularly patterned defect due to the tendency of the coated layers to reproduce any deformation present on the support.

摘要翻译： 本发明涉及一种用于感光照相元件的支撑基座。 特别地，本发明涉及一种支撑基底，其包括在其上涂覆有由保护层覆盖的至少两个防晕层的载体。本发明的感光照相元件的支撑基底呈现出改善的涂层质量，其形成减少 由于涂层再现存在于载体上的任何变形的趋势，被定义为不规则图案的缺陷。