公开(公告)号：US20090199901A1

公开(公告)日：2009-08-13

申请号：US12028457

申请日：2008-02-08

申请人： Roland Trassl ,  Sven Schramm ,  Winfried Wolke ,  Jan Catoir

发明人： Roland Trassl ,  Sven Schramm ,  Winfried Wolke ,  Jan Catoir

IPC分类号： H01L31/00 ,  H01L21/3105

CPC分类号： H01L31/02168 ,  H01L31/18 ,  Y02E10/50

摘要： The present invention refers to a method of producing a photovoltaic device having at least one semiconductor unit comprising the following steps: a cleaning of at least one surface of the semiconductor unit by etching; drying of the at least one surface of the semiconductor unit in a substantially oxygen-free or oxygen-depleted environment; and depositing of a passivation layer on the at least one surface as well as to a device for carrying out such a method and to photovoltaic devices produced by this method.

摘要翻译： 本发明涉及一种制造具有至少一个半导体单元的光伏器件的方法，包括以下步骤：通过蚀刻来清洁半导体单元的至少一个表面; 在基本上无氧或耗氧的环境中干燥半导体单元的至少一个表面; 以及在所述至少一个表面上沉积钝化层以及用于执行这种方法的设备以及通过该方法制造的光伏器件。