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公开(公告)号:US20110189493A1
公开(公告)日:2011-08-04
申请号:US13056719
申请日:2009-07-31
申请人: Matthias Ott , Ingo Grunwald , Dirk Salz , Michael Wagener , Klaus-Dieter Vissing , Wolfgang Hielscher , Christopher Dölle
发明人: Matthias Ott , Ingo Grunwald , Dirk Salz , Michael Wagener , Klaus-Dieter Vissing , Wolfgang Hielscher , Christopher Dölle
摘要: The present invention relates to the use of a crosslinked, silicon-containing layer containing, substantially consisting of or consisting of silicon, O, C, H, optionally N which can be produced by plasma polymerization and/or crosslinking of organosilicon liquids by a plasma process and/or UV radiation of a wavelength of less than 250 nm, without using metals of an atomic number of more than 14, as a biocompatible surface, for imparting to a surface or providing a surface with a non-genotoxic effect. The invention also relates to correspondingly coated articles and to processes for the production thereof.
摘要翻译: 本发明涉及含有基本上由硅,O,C,H,任选的N组成或由其组成的交联的含硅层,其可通过等离子体等离子体聚合和/或交联有机硅液体来制备 波长小于250nm的工艺和/或UV辐射,不使用原子数大于14的金属作为生物相容性表面,用于赋予表面或提供具有非遗传毒性作用的表面。 本发明还涉及相应的涂覆制品及其生产方法。
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公开(公告)号:US08992590B2
公开(公告)日:2015-03-31
申请号:US13056719
申请日:2009-07-31
申请人: Matthias Ott , Ingo Grunwald , Dirk Salz , Michael Wagener , Klaus-Dieter Vissing , Wolfgang Hielscher , Christopher Dölle
发明人: Matthias Ott , Ingo Grunwald , Dirk Salz , Michael Wagener , Klaus-Dieter Vissing , Wolfgang Hielscher , Christopher Dölle
摘要: The present invention relates to the use of a crosslinked, silicon-containing layer containing, substantially consisting of or consisting of silicon, O, C, H, optionally N which can be produced by plasma polymerization and/or crosslinking of organosilicon liquids by a plasma process and/or UV radiation of a wavelength of less than 250 nm, without using metals of an atomic number of more than 14, as a biocompatible surface, for imparting to a surface or providing a surface with a non-genotoxic effect. The invention also relates to correspondingly coated articles and to processes for the production thereof.
摘要翻译: 本发明涉及含有基本上由硅,O,C,H,任选的N组成或由其组成的交联的含硅层,其可通过等离子体等离子体聚合和/或交联有机硅液体来制备 波长小于250nm的工艺和/或UV辐射,不使用原子数大于14的金属作为生物相容性表面,用于赋予表面或提供具有非遗传毒性作用的表面。 本发明还涉及相应的涂覆制品及其生产方法。
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