摘要:
Example embodiments disclose an image sensor capable of preventing or reducing image lag and a method of manufacturing the same. Example methods may include forming a gate insulating film and a gate conductive film doped with a first-conductive-type dopant on a semiconductor substrate; forming a transfer gate pattern by patterning the gate insulating film and the gate conductive film; and fabricating a transfer gate electrode by forming a first-conductive-type photodiode in the semiconductor substrate adjacent to one region of the transfer gate pattern, by forming a second-conductive-type photodiode on the first-conductive-type photodiode, and by forming a first-conductive-type floating diffusion region in the semiconductor substrate adjacent to the other region of the transfer gate pattern.
摘要:
Example embodiments disclose an image sensor capable of preventing or reducing image lag and a method of manufacturing the same. Example methods may include forming a gate insulating film and a gate conductive film doped with a first-conductive-type dopant on a semiconductor substrate; forming a transfer gate pattern by patterning the gate insulating film and the gate conductive film; and fabricating a transfer gate electrode by forming a first-conductive-type photodiode in the semiconductor substrate adjacent to one region of the transfer gate pattern, by forming a second-conductive-type photodiode on the first-conductive-type photodiode, and by forming a first-conductive-type floating diffusion region in the semiconductor substrate adjacent to the other region of the transfer gate pattern.
摘要:
Example embodiments disclose an image sensor capable of preventing or reducing image lag and a method of manufacturing the same. Example methods may include forming a gate insulating film and a gate conductive film doped with a first-conductive-type dopant on a semiconductor substrate; forming a transfer gate pattern by patterning the gate insulating film and the gate conductive film; and fabricating a transfer gate electrode by forming a first-conductive-type photodiode in the semiconductor substrate adjacent to one region of the transfer gate pattern, by forming a second-conductive-type photodiode on the first-conductive-type photodiode, and by forming a first-conductive-type floating diffusion region in the semiconductor substrate adjacent to the other region of the transfer gate pattern.
摘要:
The present invention relates to an armature core of a start motor in which in which the depth of a slop in which an insulation member installed in a core is overlapped is deeper than other insulation members by 1.5 through 2.5 times compared to the thickness of an insulation member, and the width of the slot is the same as that of the other slots. There is provided an armature core of a start motor in which a width “a” of the insulation overlapping slot and a width “b” of other slot are same, and a depth “A” of the overlapping slot is 1.5 through 2.5 times of a thickness of the insulation member compared to a depth “B” of the slot, and a groove is formed at an entrance portion of the slot in a structure that a front end and rear end of an insulation member are overlapped and inserted in an armature core of a start motor, and one insulation member overlapping slot and a plurality of slots each having a certain width and depth are radially formed.
摘要:
Disclosed are a plasma display panel, apparatus for fabricating the same, and fabrication process thereof enabling to reduce the time for a product process and prevent panel characteristic reduction and panel damage by preventing the generation of impurity gas and achieving the plates-combination at a room temperature. The present invention includes a passivation layer formation means, a substrate transfer means, a cleaning means, a sealing material coating means, and a discharge gas injection/combination means. The present invention is constructed so as to be isolated from the atmosphere. The constructions of the fabrication process and PDP enables the normal temperature combination/attachment so as to increase product efficiency by reducing a process time and improve product quality by preventing the panel characteristic reduction.