METHODS OF MODELING A TRANSMITTER-RECEIVER SYSTEM AND RELATED METHODS OF DESIGNING A TRANSMITTER-RECEIVER SYSTEM
    1.
    发明申请
    METHODS OF MODELING A TRANSMITTER-RECEIVER SYSTEM AND RELATED METHODS OF DESIGNING A TRANSMITTER-RECEIVER SYSTEM 审中-公开
    发射机 - 接收机系统的建模方法及相关设计发射机 - 接收机系统的方法

    公开(公告)号:US20120065954A1

    公开(公告)日:2012-03-15

    申请号:US13232004

    申请日:2011-09-14

    Applicant: Woo-Jin Jin

    Inventor: Woo-Jin Jin

    CPC classification number: G06F17/5036 G06F2217/82

    Abstract: A transmitter-receiver system is modeled by representing an output driver connected to an output node of a transmitter with a capacitive characteristic at the output node, representing a receiving buffer connected to an input node of a receiver, and representing a transmission path between the output node of the transmitter and the input node of the receiver.

    Abstract translation: 发射机 - 接收机系统通过在输出节点处表示连接到具有电容特性的发射机的输出节点的输出驱动器来表示连接到接收机的输入节点的接收缓冲器,并且表示输出 发射机的节点和接收机的输入节点。

    Metal I/O ring structure providing on-chip decoupling capacitance
    2.
    发明授权
    Metal I/O ring structure providing on-chip decoupling capacitance 有权
    金属I / O环结构提供片上去耦电容

    公开(公告)号:US07227200B2

    公开(公告)日:2007-06-05

    申请号:US11145984

    申请日:2005-06-07

    Applicant: Woo-jin Jin

    Inventor: Woo-jin Jin

    CPC classification number: H01L23/5223 H01L2924/0002 H01L2924/00

    Abstract: There are provided a metal I/O ring structure for a semiconductor chip and a decoupling capacitance structure using the same. In the Metal I/O ring structure, a plurality of first metal lines are formed on a first metal layer and connected with a power supply voltage, and a plurality of second metal lines are formed on the first metal layer and connected with a ground voltage. The second metal lines are arranged neighboring to the first metal lines. The second metal lines are connected with a second metal layer disposed below the first metal lines on the metal layer, and the first metal lines are connected with the second metal layer disposed below the second metal lines on the first metal layer. An insulating layer is disposed between the first metal layer and the second metal layer, thereby forming a decoupling capacitance between the first metal lines and the second metal lines.

    Abstract translation: 提供了用于半导体芯片的金属I / O环结构和使用其的去耦电容结构。 在金属I / O环结构中,多个第一金属线形成在第一金属层上并与电源电压连接,并且多个第二金属线形成在第一金属层上并与接地电压 。 第二金属线布置成与第一金属线相邻。 第二金属线与设置在金属层上的第一金属线下方的第二金属层连接,并且第一金属线与设置在第一金属层上的第二金属线下方的第二金属层连接。 绝缘层设置在第一金属层和第二金属层之间,从而在第一金属线和第二金属线之间形成去耦电容。

    Metal I/O ring structure providing on-chip decoupling capacitance
    3.
    发明申请
    Metal I/O ring structure providing on-chip decoupling capacitance 有权
    金属I / O环结构提供片上去耦电容

    公开(公告)号:US20060071241A1

    公开(公告)日:2006-04-06

    申请号:US11145984

    申请日:2005-06-07

    Applicant: Woo-jin Jin

    Inventor: Woo-jin Jin

    CPC classification number: H01L23/5223 H01L2924/0002 H01L2924/00

    Abstract: There are provided a metal I/O ring structure for a semiconductor chip and a decoupling capacitance structure using the same. In the Metal I/O ring structure, a plurality of first metal lines are formed on a first metal layer and connected with a power supply voltage, and a plurality of second metal lines are formed on the first metal layer and connected with a ground voltage. The second metal lines are arranged neighboring to the first metal lines. The second metal lines are connected with a second metal layer disposed below the first metal lines on the metal layer, and the first metal lines are connected with the second metal layer disposed below the second metal lines on the first metal layer. An insulating layer is disposed between the first metal layer and the second metal layer, thereby forming a decoupling capacitance between the first metal lines and the second metal lines.

    Abstract translation: 提供了用于半导体芯片的金属I / O环结构和使用其的去耦电容结构。 在金属I / O环结构中,多个第一金属线形成在第一金属层上并与电源电压连接,并且多个第二金属线形成在第一金属层上并与接地电压 。 第二金属线布置成与第一金属线相邻。 第二金属线与设置在金属层上的第一金属线下方的第二金属层连接,并且第一金属线与设置在第一金属层上的第二金属线下方的第二金属层连接。 绝缘层设置在第一金属层和第二金属层之间,从而在第一金属线和第二金属线之间形成去耦电容。

Patent Agency Ranking