公开(公告)号：US5134015A

公开(公告)日：1992-07-28

申请号：US596013

申请日：1990-10-11

申请人： Yasuhisa Ohtake ,  Yasushi Magaki

发明人： Yasuhisa Ohtake ,  Yasushi Magaki

IPC分类号： G03C11/08 ,  H01J9/14

CPC分类号： H01J9/142 ,  G03C11/08 ,  Y10S428/901 ,  Y10T428/24802 ,  Y10T428/265 ,  Y10T428/31663

摘要： An aperture pattern-printing plate used for manufacturing a shadow mask, which comprises a transparent substrate, and an emulsion layer which is formed on the transparent substrate and which is opaque at portions corresponding to apertures of the shadow mask and transparent at other portions, wherein the emulsion layer is overlaid with at least one of the following a substantially-amorphous, transparent scratch-preventing film obtained by hydrolysis and condensation of metal alcoholate and having a thickness of not more than 1.5 .mu.m, and a foreign matter-preventing film formed substantially of silicone and having a thickness of not more than 0.5 .mu.m. The foreign matter-preventing film is formed on the scratch-preventing film if the foreign matter-preventing film and scratch-preventing film are both formed.

公开(公告)号：US5128224A

公开(公告)日：1992-07-07

申请号：US486746

申请日：1990-03-01

申请人： Yasuhisa Ohtake ,  Yasushi Magaki ,  Mitsuaki Yamazaki ,  Seiji Sagou ,  Hiroshi Tanaka

发明人： Yasuhisa Ohtake ,  Yasushi Magaki ,  Mitsuaki Yamazaki ,  Seiji Sagou ,  Hiroshi Tanaka

IPC分类号： G03F1/00 ,  H01J9/14

CPC分类号： H01J9/142

摘要： A method of manufacturing an aperture pattern printing plate in a limited number of steps using only one original printing plate. The method produces transparent portions on a portion of the printing plate corresponding to a non-effective area of a shadow mask, and opaque portions on a portion of the printing plate corresponding to an effective area of a shadow mask. The method has the steps of bringing a transparent plate having an unexposed transparent photosensitive layer formed on at least one of its principal surfaces into contact with an original plate having opaque areas corresponding to apertures in a to be constructed shadow mask. A first exposure is performed on the photosensitive layer through the original plate. The photosensitive layer is then developed to render exposed portions of the photosensitive layer opaque. These opaque portions are then etched away. A portion of the photosensitive layer corresponding to the non-effective area of a shadow mask is then covered to prevent exposure. A second exposure of the photosensitive layer is then performed; thereby achieving exposure of only the portion of the photosensitive layer corresponding to an effective area of a shadow mask. The photosensitive layer is then developed to render the exposed portions of the photosensitive layer opaque. By etching away the opaque portions produced after development of the first exposure, air passages are produced on the whole surface of the transparent plate.

公开(公告)号：US5411822A

公开(公告)日：1995-05-02

申请号：US108520

申请日：1993-08-18

申请人： Yasuhisa Ohtake ,  Seiji Sago ,  Yasushi Magaki

发明人： Yasuhisa Ohtake ,  Seiji Sago ,  Yasushi Magaki

IPC分类号： H01J9/14 ,  H01J29/07 ,  G03F9/00

CPC分类号： H01J29/076 ,  H01J9/142

摘要： A shadow mask includes a mask substrate having vertical and horizontal axes passing through a center of the substrate, and a number of substantially rectangular apertures. The apertures are arranged so that a plurality of vertical trains of apertures extending parallel to the vertical axis are arranged at predetermined intervals in the direction of the horizontal axis. Each of the apertures other than the apertures located on the vertical axis has a pair of outer corners distant from the vertical axis, a pair of inner corners less distant from the vertical-axis side, and a pair of bulging portions extending from the outer corners, respectively, outward in the horizontal direction. The farther each of the apertures is located from the vertical axis, the longer the bulging portions extend outward.

摘要翻译： 荫罩包括具有通过基板的中心的垂直和水平轴线的多个基本上矩形的孔的掩模基板。 孔被布置成使得平行于垂直轴线延伸的多个垂直的孔列布置在水平轴线的方向上以预定的间隔。 除了位于垂直轴线上的孔以外的每个孔具有远离垂直轴线的一对外角，远离垂直轴侧的一对内角，以及从外角延伸的一对凸出部 分别在水平方向外侧。 每个孔径越远离垂直轴线，凸出部分向外延伸的越长。

公开(公告)号：US5280215A

公开(公告)日：1994-01-18

申请号：US796346

申请日：1991-11-22

申请人： Yasuhisa Ohtake ,  Seiji Sago ,  Yasushi Magaki

发明人： Yasuhisa Ohtake ,  Seiji Sago ,  Yasushi Magaki

IPC分类号： H01J9/14 ,  H01J29/07

CPC分类号： H01J29/076 ,  H01J9/142

摘要： A shadow mask includes a mask substrate having vertical and horizontal axes passing through a center of the substrate, and a number of substantially rectangular apertures. The apertures are arranged so that a plurality of vertical trains of apertures extending parallel to the vertical axis are arranged at predetermined intervals in the direction of the horizontal axis. Each of the apertures other than the apertures located on the vertical axis has a pair of outer corners distant from the vertical axis, a pair of inner corners less distant from the vertical-axis side, and a pair of bulging portions extending from the outer corners, respectively, outward in the horizontal direction. The farther each of the apertures is located from the vertical axis, the longer the bulging portions extend outward.

摘要翻译： 荫罩包括具有通过基板的中心的垂直和水平轴线的多个基本上矩形的孔的掩模基板。 孔被布置成使得平行于垂直轴线延伸的多个垂直的孔列布置在水平轴线的方向上以预定的间隔。 除了位于垂直轴线上的孔以外的每个孔具有远离垂直轴线的一对外角，远离垂直轴侧的一对内角，以及从外角延伸的一对凸出部 分别在水平方向外侧。 每个孔径越远离垂直轴线，凸出部分向外延伸的越长。

公开(公告)号：US5260153A

公开(公告)日：1993-11-09

申请号：US791330

申请日：1991-11-14

申请人： Yasuhisa Ohtake ,  Yasushi Magaki ,  Mitsuaki Yamazaki ,  Seiji Sagou ,  Hiroshi Tanaka

发明人： Yasuhisa Ohtake ,  Yasushi Magaki ,  Mitsuaki Yamazaki ,  Seiji Sagou ,  Hiroshi Tanaka

IPC分类号： G03F1/00 ,  H01J9/14 ,  G03F9/00

CPC分类号： H01J9/142

摘要： An aperture pattern printing plate for manufacturing a shadow mask having an opaque layer form in parts on a surface of a transparent plate. The parts of the opaque layer corresponding to apertures in an effective area of the shadow mask. The opaque layer projecting from the transparent plate, and having a thickness of 30 to 50 .mu.m.

摘要翻译： 一种用于制造在透明板的表面上具有不透明层的阴影掩模的孔图案印刷版。 不透明层的部分对应于荫罩的有效区域中的孔。 不透明层从透明板突出，厚度为30-50μm。