公开(公告)号：US07351349B2

公开(公告)日：2008-04-01

申请号：US10807537

申请日：2004-03-23

申请人： Yehuda Shekel ,  Ira M Hartman ,  George A Thompson

发明人： Yehuda Shekel ,  Ira M Hartman ,  George A Thompson

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： H01L21/67075 ,  C23F1/16 ,  G01N21/3577 ,  G01N21/359

摘要： Methods and apparatus for real-time dynamic analysis of a chemical etching process are provided. The apparatus comprises an optical element (36) operative to pass a beam of electromagnetic radiation at least at two points in time through a liquid phase (42) comprising at least one chemical component and including an etchant, wherein the etchant is operative to etch a solid. A detector (60) is operative to perform an ex-situ non-contact scanning detection of the electromagnetic radiation subsequent to passing through the liquid phase in a near infra-red range (700-2500 nm) at the at least at two points in time so as to detect a change in an optical property of at least one of the at least one chemical component and the etchant. The apparatus further comprises a processor (64) operative to activate an algorithm so as to compare the change in the optical property of the at least of the at least one chemical component and the etchant received from the detector so as to provide data concerning a change in concentration of the etchant; and further configured to perform a chemometric manipulation of the data so as to provide a rate of etching of the solid.

摘要翻译： 提供了化学蚀刻工艺的实时动态分析方法和装置。 所述装置包括光学元件（36），其操作以至少在两个时间点通过包含至少一种化学成分并包括蚀刻剂的液相（42）的电磁辐射束，其中所述蚀刻剂可操作以蚀刻 固体。 检测器（60）可操作用于在至少在两个点处的近红外范围（700-2500nm）中通过液相之后执行电磁辐射的非原位非接触扫描检测 以便检测至少一种化学成分和蚀刻剂中的至少一种的光学特性的变化。 所述装置还包括处理器（64），其用于激活算法，以便比较所述至少一个化学成分中的至少一个化学成分和从检测器接收的蚀刻剂的光学特性的变化，以便提供关于变化的数据 浓度为蚀刻剂; 并且还被配置为执行数据的化学计量操作，以便提供固体的蚀刻速率。

公开(公告)号：US20090182520A1

公开(公告)日：2009-07-16

申请号：US12097015

申请日：2006-12-12

申请人： Yoav Luxembourg ,  Erez Avrahamov ,  Refael Barkan ,  Yehuda Shekel ,  Ira Hartman

发明人： Yoav Luxembourg ,  Erez Avrahamov ,  Refael Barkan ,  Yehuda Shekel ,  Ira Hartman

IPC分类号： G06F19/00 ,  G01N21/87

CPC分类号： G01N21/87 ,  G01N33/381

摘要： Disclosed are methods and devices for assessing the colors of diamonds. In embodiments, the color of finished diamonds cut from a given rough diamond is assessed by analyzing the effect on light interacting with the rough diamond to give a reasonable (that is to say commercially significant) assessment of the color quality of the finished diamond.

摘要翻译： 公开了用于评估钻石颜色的方法和装置。 在实施例中，通过分析与粗糙金刚石相互作用的光的影响来评估从给定粗糙金刚石切割的成品钻石的颜色，以给出成品钻石的颜色质量的合理（即商业上显着的）评估。

公开(公告)号：US20170041263A1

公开(公告)日：2017-02-09

申请号：US14821617

申请日：2015-08-07

申请人： Oded Yehuda Shekel

发明人： Oded Yehuda Shekel

IPC分类号： H04L12/58 ,  H04L29/08

CPC分类号： H04L51/12 ,  H04L12/1822 ,  H04L51/04 ,  H04L51/20 ,  H04L63/0414 ,  H04L67/18

摘要： A method and a device are disclosed including software components that allow users to join an ongoing local anonymous chat room, create a new one, or vote to support the creation of a new one. The chat room system prevents a potential participant from joining a local chat room if the participant does not reside in a predefined geographic area as other users/participants of the chat room. The chat room system may further restrict the types of interactions allowed in the anonymous chat room, such as abusive language. Such restrictions may be done automatically via software, a human administrator, majority and/or weighted vote of other participants, or a combination of these. In some embodiments, chat rooms may be further restricted to a particular subject or industry, an age range, gender, or list of locations, among others. Physical or geographic proximity may be verified via IP address geo-location techniques.

摘要翻译： 公开了一种方法和设备，其包括允许用户加入正在进行的本地匿名聊天室，创建新的聊天室或投票支持创建新的聊天室的软件组件。 聊天室系统如果参与者不作为聊天室的其他用户/参与者驻留在预定义的地理区域中，则阻止潜在参与者加入本地聊天室。 聊天室系统可以进一步限制在匿名聊天室中允许的交互类型，例如滥用语言。 这些限制可以通过软件，人类管理员，其他参与者的多数和/或加权投票或这些的组合自动完成。 在一些实施例中，聊天室可以进一步限于特定主题或行业，年龄范围，性别或位置列表等。 可以通过IP地址地理位置技术来验证物理或地理接近度。

公开(公告)号：US20050028932A1

公开(公告)日：2005-02-10

申请号：US10807537

申请日：2004-03-23

申请人： Yehuda Shekel ,  Ira Hartman ,  George Thompson

发明人： Yehuda Shekel ,  Ira Hartman ,  George Thompson

IPC分类号： C23F1/16 ,  G01N21/35 ,  H01L21/304 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01L21/67075 ,  C23F1/16 ,  G01N21/3577 ,  G01N21/359

摘要： Methods and apparatus for real-time dynamic analysis of a chemical etching process are provided. The apparatus comprises an optical element (36) operative to pass a beam of electromagnetic radiation at least at two points in time through a liquid phase (42) comprising at least one chemical component and including an etchant, wherein the etchant is operative to etch a solid. A detector (60) is operative to perform an ex-situ non-contact scanning detection of the electromagnetic radiation subsequent to passing through the liquid phase in a near infra-red range (700-2500 nm) at the at least at two points in time so as to detect a change in an optical property of at least one of the at least one chemical component and the etchant. The apparatus further comprises a processor (64) operative to activate an algorithm so as to compare the change in the optical property of the at least of the at least one chemical component and the etchant received from the detector so as to provide data concerning a change in concentration of the etchant; and further configured to perform a chemometric manipulation of the data so as to provide a rate of etching of the solid.

摘要翻译： 提供了化学蚀刻工艺的实时动态分析方法和装置。 所述装置包括光学元件（36），其操作以至少在两个时间点通过包含至少一种化学成分并包括蚀刻剂的液相（42）的电磁辐射束，其中所述蚀刻剂可操作以蚀刻 固体。 检测器（60）可操作用于在至少在两个点处的近红外范围（700-2500nm）中通过液相之后执行电磁辐射的非原位非接触扫描检测 以便检测至少一种化学成分和蚀刻剂中的至少一种的光学特性的变化。 所述装置还包括处理器（64），其用于激活算法，以便比较所述至少一个化学成分中的至少一个化学成分和从检测器接收的蚀刻剂的光学特性的变化，以便提供关于变化的数据 浓度为蚀刻剂; 并且还被配置为执行数据的化学计量操作，以便提供固体的蚀刻速率。

公开(公告)号：US20080190557A1

公开(公告)日：2008-08-14

申请号：US12069189

申请日：2008-02-07

申请人： Yehuda Shekel ,  Ira M. Hartman ,  George A. Thompson

发明人： Yehuda Shekel ,  Ira M. Hartman ,  George A. Thompson

IPC分类号： C23F1/08

CPC分类号： H01L21/67075 ,  C23F1/16 ,  G01N21/3577 ,  G01N21/359

摘要： An apparatus comprising a near infrared (NIR) spectrometer and a processor with an algorithm configured to acquire NIR spectral data and perform a chemometric data manipulation provides direct measurement of the etch rate for semiconductor wafer etchant solutions. The apparatus may also provide the concentrations of species in etchant and cleaning solutions, and automated process control. The apparatus may be used for analysis and control of other processing solutions.

摘要翻译： 包括近红外（NIR）光谱仪和具有被配置为获取NIR光谱数据并执行化学计量数据操作的算法的处理器的设备提供对半导体晶片蚀刻剂溶液的蚀刻速率的直接测量。 该设备还可以提供腐蚀剂和清洁溶液中物种的浓度以及自动化过程控制。 该装置可用于其他处理方案的分析和控制。