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1.发明授权Methods for developing and instantiating object classes using a java virtual machine extension 失效使用Java虚拟机扩展开发和实例化对象类的方法
公开(公告)号：US5943496A
公开(公告)日：1999-08-24
申请号：US858095
申请日：1997-05-17
CPC分类号： G06F9/4428 , G06F9/445
摘要： An extension to the JVM is described by which the efficiency with which applications are developed and transmitted between platforms is vastly improved. The present invention imposes a new object model on the Java object model provided intrinsically by the Java programming language. The object model of the present invention separates attribute data from an object which would otherwise be encapsulated therein. This data represents the external interface of a particular instance of the object class. The internal interface of the object class, i.e., the behavior common to all instances of a particular object type, is stored separately in an object type information file.
摘要翻译： 描述了对JVM的扩展，其中在平台之间开发和传输应用程序的效率大大提高。 本发明在由Java编程语言本质上提供的Java对象模型上强加了一个新的对象模型。 本发明的对象模型将属性数据与将被封装在其中的对象分开。 该数据表示对象类的特定实例的外部接口。 对象类的内部接口，即特定对象类型的所有实例共同的行为，分别存储在对象类型信息文件中。
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2.发明授权公开(公告)号：US08160830B2
公开(公告)日：2012-04-17
申请号：US12314886
申请日：2008-12-18
申请人： I-Yun Leu , Wen-Ju Yang , Jen-Kuei Wu , Yun-Yong Shen , Huan-Yung Chang
发明人： I-Yun Leu , Wen-Ju Yang , Jen-Kuei Wu , Yun-Yong Shen , Huan-Yung Chang
IPC分类号： G06F19/00
摘要： A method of yield management for semiconductor manufacture and an apparatus thereof are provided. The method includes the following steps. Defect data of a layer of a semiconductor wafer is obtained, wherein the defect data includes sizes and locations of defects with respect to the layer. A layout with respect to the layer is obtained. And a critical area analysis is performed in parallel for the layer by a plurality of processing devices according to the defect data and the layout to determine locations of defects falling into a critical area of the layer among the locations of the defects.
摘要翻译： 提供了半导体制造的成品率管理方法及其装置。 该方法包括以下步骤。 获得半导体晶片层的缺陷数据，其中缺陷数据包括相对于该层的缺陷的尺寸和位置。 获得相对于该层的布局。 并且通过多个处理装置根据缺陷数据和布局对该层并行执行关键区域分析，以确定落入缺陷位置之间的层的关键区域的缺陷的位置。
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3.发明授权Data structure and methods for defining and using attribute data blocks to instantiate objects and describe changes to objects 失效用于定义和使用属性数据块来实例化对象并描述对象更改的数据结构和方法
公开(公告)号：US5884097A
公开(公告)日：1999-03-16
申请号：US857231
申请日：1997-05-17
CPC分类号： G06F9/465
摘要： A data structure and method are disclosed for transferring object attributes between platforms in a distributed computing environment. The method includes creating an application description file. The application description file includes a type ID and an object name. The type ID references a type information file. The application file includes an attribute data block and the attribute data block contains data for attributes that are included in the object. The attribute description file is transferred to a platform that includes the type information file and the type information file includes a memory offset map that determines a sequence of attribute data storage in the attribute data block. Thus, the object attributes are received by the platform and the type information file provides a memory offset map for individual attributes in the attribute description file.
摘要翻译： 公开了用于在分布式计算环境中的平台之间传送对象属性的数据结构和方法。 该方法包括创建应用程序描述文件。 应用程序描述文件包括类型ID和对象名称。 类型ID引用类型信息文件。 应用文件包括属性数据块，属性数据块包含对象中包含的属性的数据。 将属性描述文件传送到包括类型信息文件的平台，并且类型信息文件包括确定属性数据块中的属性数据存储序列的存储器偏移映射。 因此，平台接收对象属性，并且类型信息文件为属性描述文件中的各个属性提供存储器偏移映射。
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4.发明申请公开(公告)号：US20090299669A1
公开(公告)日：2009-12-03
申请号：US12314886
申请日：2008-12-18
申请人： I-Yun Leu , Wen-Ju Yang , Jen-Kuei Wu , Yun-Yong Shen , Huan-Yung Chang
发明人： I-Yun Leu , Wen-Ju Yang , Jen-Kuei Wu , Yun-Yong Shen , Huan-Yung Chang
IPC分类号： G06F19/00
摘要： A method of yield management for semiconductor manufacture and an apparatus thereof are provided. The method includes the following steps. Defect data of a layer of a semiconductor wafer is obtained, wherein the defect data includes sizes and locations of defects with respect to the layer. A layout with respect to the layer is obtained. And a critical area analysis is performed in parallel for the layer by a plurality of processing devices according to the defect data and the layout to determine locations of defects falling into a critical area of the layer among the locations of the defects.
摘要翻译： 提供了半导体制造的成品率管理方法及其装置。 该方法包括以下步骤。 获得半导体晶片层的缺陷数据，其中缺陷数据包括相对于该层的缺陷的尺寸和位置。 获得相对于该层的布局。 并且通过多个处理装置根据缺陷数据和布局对该层并行执行关键区域分析，以确定落入缺陷位置之间的层的关键区域的缺陷的位置。
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公开(公告)号：US08863056B2
公开(公告)日：2014-10-14
申请号：US11844186
申请日：2007-08-23
申请人： Iyun Kevin Leu , Yun Yong Shen , Greg Chang
发明人： Iyun Kevin Leu , Yun Yong Shen , Greg Chang
CPC分类号： G06F17/50 , G06F2217/12 , Y02P90/265
摘要： An integrated design-for-manufacturing (DFM) platform is provided. The integrated DFM platform an automatic warning and verification system; an automatic data feedback and feed forward system; an automatic intellectual property (IP) library management system; and a data management system integrated under a same platform.
摘要翻译： 提供了集成设计制造（DFM）平台。 集成DFM平台自动警告和验证系统; 自动数据反馈和前馈系统; 自动知识产权（IP）图书馆管理系统; 以及在同一平台下集成的数据管理系统。
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公开(公告)号：US20090055011A1
公开(公告)日：2009-02-26
申请号：US11844186
申请日：2007-08-23
申请人： Iyun Kevin Leu , Yun Yong Shen , Greg Chang
发明人： Iyun Kevin Leu , Yun Yong Shen , Greg Chang
CPC分类号： G06F17/50 , G06F2217/12 , Y02P90/265
摘要： An integrated design-for-manufacturing (DFM) platform is provided. The integrated DFM platform an automatic warning and verification system; an automatic data feedback and feed forward system; an automatic intellectual property (IP) library management system; and a data management system integrated under a same platform.
摘要翻译： 提供了集成设计制造（DFM）平台。 集成DFM平台自动警告和验证系统; 自动数据反馈和前馈系统; 自动知识产权（IP）图书馆管理系统; 以及在同一平台下集成的数据管理系统。
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