摘要:
An interferometer utilizing interference whose object is the measurement of the configuration of a test surface with high precision by allowing accurate positioning to a predetermined measuring position for the measurement of the configuration of the test surface.The interferometer is equipped with an alignment pattern (4A) which generates a wave front that converges at the predetermined measuring position, as well as a wave front for measuring the configuration corresponding to the design configuration of the test surface (9), and by using a test surface-reflected beam of the wave front generated by the alignment pattern, an alignment observation optical system (8) measures the displacement of the test surface from the predetermined measuring position.