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公开(公告)号:US10537028B2
公开(公告)日:2020-01-14
申请号:US15320016
申请日:2015-06-26
发明人: Matthew S. Stay , Matthew R. Smith , Mikhail L. Pekurovsky , John T. Strand , Moses M. David , Glen A. Jerry , Ellison G. Kawakami , Karl K. Stensvad , James R. Starkey
摘要: Electrically conductive patterns formed on a substrate are provided with a reduced visibility. A region of a major surface of the substrate is selectively roughened to form a roughened pattern on the major surface of the substrate. Electrically conductive traces are directly formed on the roughened region and are conformal with the roughened pattern on the major surface of the substrate.
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公开(公告)号:US20170142841A1
公开(公告)日:2017-05-18
申请号:US15320016
申请日:2015-06-26
发明人: Matthew S. Stay , Matthew R. Smith , Mikhail L. Pekurovsky , John T. Strand , Moses M. David , Glen A. Jerry , Ellison G. Kawakami , Karl K. Stensvad , James R. Starkey
摘要: Electrically conductive patterns formed on a substrate are provided with a reduced visibility. A region of a major surface of the substrate is selectively roughened to form a roughened pattern on the major surface of the substrate. Electrically conductive traces are directly formed on the roughened region and are conformal with the roughened pattern on the major surface of the substrate.
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