专利检索 ap:("ABHIMANYU ONKAR PATIL" OR "ANDY HAISHUNG TSOU" OR "HONGCHEN DONG") AND inv:"HONGCHEN DONG" 第 1 页

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发明申请
Atom transfer radical polymerization (ATRP) based inorganic polymer structures 审中-公开
标题翻译：基于原子转移自由基聚合（ATRP）的无机聚合物结构

公开(公告)号：US20100227162A1

公开(公告)日：2010-09-09

申请号：US12380689

申请日：2009-03-03

申请人： ABHIMANYU ONKAR PATIL , ANDY HAISHUNG TSOU , HONGCHEN DONG

发明人： ABHIMANYU ONKAR PATIL , ANDY HAISHUNG TSOU , HONGCHEN DONG

IPC分类号： B32B5/16 , C08L51/10

CPC分类号： B82Y30/00 , C08F292/00 , C08F2438/01 , C08L53/02 , C09C1/3072 , Y10T428/268 , C08F220/68

摘要： A modified inorganic substrate having a plurality of grafts of a polyalkyl acrylate or methacrylate of mean alkyl pendant chain length of 6 to about 40 carbons extending therefrom. The modified inorganic substrate is preferably a modified silica substrate and more preferably modified silica nanoparticles. There is also a process for graft polymerizing a silica substrate.

摘要翻译： 一种改性无机基材，其具有多个从其延伸的平均烷基侧链长度为约6至约40个碳原子的丙烯酸烷基酯或甲基丙烯酸烷基酯的接枝物。改性无机基材优选为改性二氧化硅基质，更优选为改性二氧化硅纳米粒子。还有一种二氧化硅底物的接枝聚合方法。