公开(公告)号：US08992086B2

公开(公告)日：2015-03-31

申请号：US14015073

申请日：2013-08-30

Applicant: Kyocera Corporation ,  Advantest Corporation

Inventor： Kouji Akashi ,  Youichi Shimizu ,  Yoshihisa Oae

IPC: F16C29/12 ,  F16C29/00 ,  B23Q1/62

CPC classification number: F16C29/007 ,  B23Q1/621 ,  F16C29/001 ,  F16C29/008 ,  F16C2322/39 ,  F16C2370/00

Abstract: Provided are X-Y constraining units having excellent yawing attitude precision as well as a stage apparatus and a vacuum stage apparatus, each including the X-Y constraining units. The X-Y constraining units 8 and 9 includes: Y-axis bases 81 and 91 respectively connected to Y-axis sliders 4 and 5 and having a through hole extending along Z direction; X-axis bases 82 and 92 respectively connected to an X-axis guide rail 6; shafts 83 and 93 respectively inserted into the through hole and fixed to the X-axis bases 82 and 92; and a plurality of bearing balls which are located between an inner peripheral surface of each of the through hole and an outer peripheral surface of the shafts 83 and 93, and are arranged so as to circumferentially surround the shafts 83 and 93. Each of the stage apparatus 1 and the vacuum stage apparatus includes the X-Y constraining units.

Abstract translation: 提供具有优异的偏转姿态精度的X-Y约束单元以及包括X-Y约束单元的平台装置和真空级装置。 X-Y约束单元8和9包括：分别连接到Y轴滑块4,5的Y轴基座81和91，并具有沿Z方向延伸的通孔; 分别连接到X轴导轨6的X轴座82和92; 轴83和93分别插入通孔并固定到X轴座82和92; 以及多个轴承滚珠，它们位于每个通孔的内周表面和轴83和93的外周表面之间，并且被布置成围绕轴83和93周向地围绕。 装置1和真空级装置包括XY约束单元。

公开(公告)号：US10824077B2

公开(公告)日：2020-11-03

申请号：US16498394

申请日：2017-04-11

Applicant: ADVANTEST CORPORATION

Inventor： Youichi Shimizu ,  Hitoshi Tanaka

IPC: G03F7/20 ,  H01J37/18 ,  H01J37/317

Abstract: An exposure device is provided, including: a body tube depressurized to produce a vacuum state therein; a plurality of charged particle beam sources that are provided in the body tube, and emit a plurality of charged particle beams in a direction of extension of the body tube; a plurality of electromagnetic optical elements, each being corresponding to one of the plurality of charged particle beams in the body tube, and controls the one of the plurality of charged particle beams; first and second partition walls that are arranged separately from each other in the direction of extension in the body tube, and form non-vacuum spaces between at least parts of the first and second partition walls; and a depressurization pump that depressurizes a non-vacuum space that contacts the first partition wall and a non-vacuum space that contacts the second partition wall to an air pressure between zero and atmospheric pressure.

公开(公告)号：US11101106B2

公开(公告)日：2021-08-24

申请号：US16499327

申请日：2017-04-11

Applicant: ADVANTEST CORPORATION

Inventor： Youichi Shimizu ,  Hitoshi Tanaka

IPC: H01J37/31 ,  H01J37/14 ,  H01J37/20 ,  H01J37/317 ,  H01J37/141

Abstract: A multi-beam exposure device reducing variations of electron beam optical systems for electron beams, and preventing vacuum leakage. An exposure device is provided, including: a body tube depressurized to produce a vacuum state therein; multiple charged particle beam sources provided in the body tube, and emitting multiple charged particle beams in a direction of extension of the body tube; multiple electromagnetic optical elements, each provided corresponding to one of the multiple charged particle beams in the body tube, and controlling the one of the multiple charged particle beams; first and second partition walls arranged separately from each other in the direction of extension in the body tube, and forming a non-vacuum space between at least parts of the first and second partition walls; and a supporting unit provided in the body tube, and supporting the multiple electromagnetic optical elements for positioning of the multiple electromagnetic optical elements.