公开(公告)号：US20230133905A1

公开(公告)日：2023-05-04

申请号：US18088989

申请日：2022-12-27

Applicant: AGC Inc.

Inventor： Takefumi ABE ,  Saki TAKEI ,  Kaori TSURUOKA ,  Keigo MATSUURA ,  Yoshitaka NOMURA ,  Nobuyuki OTOZAWA ,  Tomoaki SAKURADA

IPC: C08G65/00 ,  G02B1/04 ,  C08J5/18

Abstract: Provided are a curable composition and an application thereof. The curable composition contains: a compound A having a polymerizable group (a) and an oxyfluoroalkylene group; a polymerization initiator; and a compound B having a polymerizable group different from the polymerizable group (a). The polymerizable group (a) in the compound A is at least one selected from the group consisting of a vinylphenyl group, a vinylphenyloxy group, a vinylbenzyloxy group, a vinyloxy group, a vinyloxycarbonyl group, a vinylamino group, a vinylaminocarbonyl group, a vinylthio group, an allyloxy group, an allyloxycarbonyl group, an allylamino group, an allylaminocarbonyl group, an allylthio group, an epoxy group, and an epoxycycloalkyl group.

公开(公告)号：US20220372186A1

公开(公告)日：2022-11-24

申请号：US17817132

申请日：2022-08-03

Applicant: AGC Inc.

Inventor： Takefumi ABE ,  Kaori TSURUOKA ,  Tetsuji SHIMOHIRA ,  Saki TAKEI ,  Shotaro BEPPU

IPC: C08F214/26 ,  H01L51/00

Abstract: A fluorinated polymer suitable for deposition is provided. A film containing such a fluorinated polymer as a material is provided. A method for producing a film, by which such a film can readily be produced, is provided. Further, an organic photoelectronic element having such a film in its structure is provided.
A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is 200° C. or higher, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 100° C.

公开(公告)号：US20220372180A1

公开(公告)日：2022-11-24

申请号：US17817168

申请日：2022-08-03

Applicant: AGC Inc.

Inventor： Takefumi ABE ,  Kaori TSURUOKA ,  Tetsuji SHIMOHIRA ,  Saki TAKEI ,  Shotaro BEPPU

IPC: C08F16/24 ,  C08F14/26 ,  C08F14/22 ,  C08F14/28 ,  C08J5/18 ,  H01L51/52 ,  H01L51/00

Abstract: A fluorinated polymer suitable for deposition and capable of favorable metal patterning, is provided. A resin film containing such a fluorinated polymer as a material is provided. Further, a photoelectronic element having such a resin film in its structure is provided.
A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is less than 200° C., or no melting point is observed, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10−3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 200° C.