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    COMPOSITION AND ARTICLE
    1.
    发明申请
    COMPOSITION AND ARTICLE 有权

    公开(公告)号：US20210348024A1

    公开(公告)日：2021-11-11

    申请号：US17443038

    申请日：2021-07-20

    Applicant: AGC Inc.

    Inventor： Keigo MATSUURA ,  Taiki HOSHINO ,  Kiyotaka TAKAO ,  Makoto UNO ,  Eiichiro ANRAKU ,  Motoshi AOYAMA ,  Naoki KATSUKI ,  Yusuke TOMIYORI ,  Toyokazu ENTA ,  Hiromasa YAMAMOTO

    IPC: C09D183/10 ,  C09D5/00 ,  C09D7/20

    Abstract: To provide a composition with which a surface layer excellent in abrasion resistance and sliding resistance can be formed, and an article.
    The composition of the present invention comprises a compound represented by the formula (1) and a compound represented by the formula (2), wherein the ratio of the number of moles of the group represented by —CF3 in Rf1 in the formula (1) to the total of the number of moles of the group represented by —CF2— closest to Y1 in Rf2 in the formula (1), the number of moles of the group represented by —CF2— closest to Y2 in Rf3 in the formula (2) and the number of moles of the group represented by —CF2— closest to Y3 in Rf3 in the formula (2), is from 0.001 to 0.1: Rf1—(OX1)m1—O—Rf2—Y1—[Si(R1)n1L13-n1]g1  (1) [L23-n2(R2)n2Si]g2—Y2—Rf3—(OX2)m2—O—Rf4—Y3—[Si(R3)n3L33-n3]g3  (2)

    COMPOUND, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT
    3.
    发明公开
    COMPOUND, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT 审中-公开

    公开(公告)号：US20230406869A1

    公开(公告)日：2023-12-21

    申请号：US18460114

    申请日：2023-09-01

    Applicant: AGC Inc.

    Inventor： Makoto UNO ,  Eiichiro ANRAKU ,  Takafumi KAWAKAMI ,  Keigo MATSUURA

    IPC: C07F7/18

    CPC classification number: C07F7/1876

    Abstract: A compound represented by the following formula (A1) or (A2):


    G1-(CH2)m1—CHX1—(CH2)n1-M   Formula (A1)



    M-(CH2)n2—CHX1—(CH2)m2-G2(CH2)m3—CHX1—(CH2)n3-M   Formula (A2).

    Where in the formula (A1) and (A2), G1, G2, X1, M, n1, n2, n3, m1, m2, and m3 are as defined in the disclosure. A method for producing a compound represented by the following formula (B1) or (B2), where M in the compound of formula (A1) or (A2) is converted into a hydrogen or hydrocarbon group represented by R3:


    G1-(CH2)m1—CHX1—(CH2)n1—R3   Formula (B1)



    R3—(CH2)n2—CHX1—(CH2)m2-G2-(CH2)m3—CHX1—(CH2)n3—R3   Formula (B2).

    Where in the formulas B1 and B2, G1, G2, X1, R3, n1, n2, n3, m1, m2, and m3 are as defined in the disclosure.

    FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING LIQUID, ARTICLE AND ITS PRODUCTION METHOD
    5.
    发明申请
    FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING LIQUID, ARTICLE AND ITS PRODUCTION METHOD 审中-公开

    公开(公告)号：US20200165273A1

    公开(公告)日：2020-05-28

    申请号：US16776559

    申请日：2020-01-30

    Applicant: AGC Inc.

    Inventor： Taiki HOSHINO ,  Eisuke MUROTANI ,  Keigo MATSUURA ,  Makoto UNO

    IPC: C07F7/08 ,  C09D183/12 ,  C09D5/00 ,  C10M107/50

    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it.A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2—SO2N(R1)(R2), wherein A is a C1-20 perfluoroalkyl group, Rf1 is a fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a fluoroalkylene group, R1 is a monovalent organic group having at least one hydrolyzable silyl group, R2 is a hydrogen atom, a monovalent organic group or a monovalent organic group having at least one hydrolyzable group, and the total number of the hydrolyzable silyl group(s) in R1 and the hydrolyzable group(s) in R2 is at least 2.

    COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE, AND METHOD FOR PRODUCING ARTICLE
    6.
    发明公开
    COMPOSITION, SURFACE TREATMENT AGENT, COATING LIQUID, ARTICLE, AND METHOD FOR PRODUCING ARTICLE 审中-公开

    公开(公告)号：US20240327653A1

    公开(公告)日：2024-10-03

    申请号：US18659424

    申请日：2024-05-09

    Applicant: AGC Inc.

    Inventor： Eisuke MUROTANI ,  Keigo MATSUURA ,  Motoshi AOYAMA ,  Hikaru ONO ,  Makoto UNO ,  Takafumi KAWAKAMI

    IPC: C09D5/16 ,  C08G77/46 ,  C09D183/12

    CPC classification number: C09D5/1675 ,  C08G77/46 ,  C09D183/12

    Abstract: An object of the present disclosure is to provide a composition, a surface treatment agent, and a coating liquid with excellent abrasion resistance, an article including a surface layer with excellent abrasion resistance, and a method for producing the article. A composition which contains two or more compounds selected from the compound represented by the formula (A1), the compound represented by the formula (A2), the compound represented by the formula (B1), and the compound represented by the formula (B2) and meets the following (I) to (III) is provided.


    Rf1—(ORf11)y1—O—R1-L1-(R11-T1)x1  (A1)



    Rf2—(ORf12)y2—O—R2-L2-(R12-T2)x2  (A2)



    (T3-R13)x3-L3-R3—(ORf13)y3—O—R23-L13-(R33-T13)x13   (B1)



    (T4-R14)x4-L4-R4—(ORf14)y4—O—R24-L14-(R34-T14)x14   (B2)

    Other symbols in the formulae are as described in the specification.

    OPTICAL FILTER AND IMAGING DEVICE
    8.
    发明公开
    OPTICAL FILTER AND IMAGING DEVICE 审中-公开

    公开(公告)号：US20230296818A1

    公开(公告)日：2023-09-21

    申请号：US18323010

    申请日：2023-05-24

    Applicant: AGC Inc.

    Inventor： Kazuhiko SHIONO ,  Nanako NISHIMOTO ,  Sayuri YAMADA ,  Hiroki HOTAKA ,  Satoshi OKADA ,  Keigo MATSUURA

    IPC: G02B5/28 ,  C09B23/08 ,  G02B5/20 ,  C09K3/00

    CPC classification number: G02B5/282 ,  C09B23/083 ,  G02B5/208 ,  C09K3/00

    Abstract: An optical filter includes: an absorption layer including a first near-infrared absorbing dye (D1), a second near-infrared absorbing dye (D2), and a transparent resin; and a reflection layer including a dielectric multilayer film. The dye (D1) and the dye (D2) are squarylium compounds satisfying following (1) to (3). (1) The dye (D1) has a maximum absorption wavelength λmax(D1) within a range of 680 to 730 nm, and the difference between a wavelength at which a transmittance is 80% on the shorter wavelength side than λmax(D1) when the concentration is adjusted such that a transmittance at λmax(D1) is 10%, and λmax(D1) is 100 nm or less. (2) The dye (D2) has a maximum absorption wavelength λmax(D2) within a range of 720 to 770 nm. (3) A value obtained by subtracting λmax(D1) from λmax(D2) is 30 nm or more and 85 nm or less.

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