公开(公告)号：US11173516B2

公开(公告)日：2021-11-16

申请号：US15288425

申请日：2016-10-07

Applicant: AGC Inc.

Inventor： Azusa Takai ,  Shuji Taneda ,  Satoshi Mototani ,  Yoshimi Otani

IPC: B05D1/04 ,  C03C17/00 ,  B05B15/58 ,  B05B5/04 ,  B05D5/06 ,  B05D7/24 ,  G02B5/02 ,  B05B14/40 ,  B05D1/02 ,  B05B5/08 ,  B05B3/10

Abstract: To provide a production method capable of producing an antiglare film-coated substrate having excellent antiglare performance in a short time, an antiglare film-coated substrate having excellent antiglare performance, and an article provided with the substrate. A method for producing an antiglare film-coated substrate 1 comprising a substrate 3 and an antiglare film 5 formed on the substrate 3, characterized by comprising a step of preparing a coating composition comprising at least one of a silica precursor (A) and particles (C), and a liquid medium (B), wherein the liquid medium (B) contains a liquid medium (B1) having a boiling point of at most 150° C. in an amount of at least 86 mass % based on the total amount of the liquid medium (B), a step of electrically charging and spraying the coating composition by using an electrostatic coating apparatus having an electrostatic coating gun having a rotary atomizing head, to apply it on the substrate 3 to form a coating film, and a step of firing the coating film to form an antiglare film 5.