Alkali-free glass substrate
    1.
    发明授权

    公开(公告)号:US11718553B2

    公开(公告)日:2023-08-08

    申请号:US16819696

    申请日:2020-03-16

    Applicant: AGC INC.

    CPC classification number: C03C3/091 C03B5/2252 G11B5/73921 C03C2201/80

    Abstract: An alkali-free glass substrate contains, as represented by mass % based on oxides: 54% to 68% of SiO2; 10% to 25% of Al2O3; 0.1% to 5.5% of B2O3; and 8% to 26% of MgO+CaO+SrO+BaO. The alkali-free glass substrate has β-OH of 0.15 mm−1 to 0.35 mm−1, and a Cl content of 0.15 to 0.3 mass %. A bubble growth index I of the alkali-free glass substrate given by the following formula is 320 or more: I=590.5×[β-OH]+874.1×[Cl]−5.7×[B2O3]−33.3. In the formula, [β-OH] is β-OH of the alkali-free glass substrate in mm−1, [Cl] is the Cl content of the alkali-free glass substrate in mass %, and [B2O3] is a B2O3 content of the alkali-free glass substrate in mass %.

    Method for manufacturing molten glass, method for manufacturing glass product, and device for manufacturing molten glass

    公开(公告)号:US10246361B2

    公开(公告)日:2019-04-02

    申请号:US15370424

    申请日:2016-12-06

    Applicant: AGC Inc.

    Abstract: There is provided a process for producing molten glass, which is capable of easily increasing the H2O content in glass melt with excessive generation of convection of the glass melt being reduced.One mode of the process for producing molten glass according to the present invention is characterized to include a material melting step for melting a raw glass material in a melting furnace to prepare glass melt; a water-molecules supply step for supplying a water-molecules supply gas into the glass melt flowing from an upstream end of the melting furnace toward a downstream end of the melting furnace; and a refining step for degassing, under a reduced pressure atmosphere, the glass melt flowing out of the downstream end; wherein a position where the water-molecules supply gas is supplied in the water-molecules supply step includes a first position and a second position from downstream to upstream in a flowing direction of the glass melt in this order; the first position is a position away from both of the upstream end and the downstream end; and the second position is a position closer to the upstream end than a center of a distance between the upstream end and the first position in the flowing direction of the glass melt.

    Alkali-free glass substrate
    3.
    发明授权

    公开(公告)号:US11584680B2

    公开(公告)日:2023-02-21

    申请号:US16819753

    申请日:2020-03-16

    Applicant: AGC INC.

    Abstract: An alkali-free glass substrate contains, as represented by mass % based on oxides: 54% to 66% of SiO2; 10% to 23% of Al2O3; 6% to 12% of B2O3; and 8% to 26% of MgO+CaO+SrO+BaO. The alkali-free glass substrate has β-OH of 0.15 mm−1 to 0.5 mm−1, and a Cl content of 0.1 to 0.35 mass %. A bubble growth index I of the alkali-free glass substrate given by the following formula is 280 or more: I=590.5×[β-OH]+874.1×[Cl]−5.7×[B2O3]−33.3. In the formula, [β-OH] is β-OH of the alkali-free glass substrate in mm−1, [Cl] is the Cl content of the alkali-free glass substrate in mass %, and [B2O3] is a B2O3 content of the alkali-free glass substrate in mass %.

    Alkali-free glass substrate
    4.
    发明授权

    公开(公告)号:US10974986B2

    公开(公告)日:2021-04-13

    申请号:US16135682

    申请日:2018-09-19

    Applicant: AGC INC.

    Abstract: The present invention relates to an alkali-free glass substrate in which when the alkali-free glass substrate is melted, and while holding a temperature at 1400° C., reduced in pressure from an atmospheric pressure to 33.33 kPa at a constant pressure reduction rate for 20 minutes and held at 33.33 kPa for 5 minutes, a diameter of a grown bubble is at least 3 times a diameter of an initial bubble. A bubble having a diameter of 0.1 to 0.3 mm contained in a molten glass at 1400° C. before starting pressure reduction is defined as the initial bubble. A bubble after held at 33.33 kPa for 5 minutes corresponding to the initial bubble is defined as a grown bubble.

    ALKALI-FREE GLASS SUBSTRATE
    6.
    发明申请

    公开(公告)号:US20190084860A1

    公开(公告)日:2019-03-21

    申请号:US16135682

    申请日:2018-09-19

    Applicant: AGC INC.

    Abstract: The present invention relates to an alkali-free glass substrate in which when the alkali-free glass substrate is melted, and while holding a temperature at 1400° C., reduced in pressure from an atmospheric pressure to 33.33 kPa at a constant pressure reduction rate for 20 minutes and held at 33.33 kPa for 5 minutes, a diameter of a grown bubble is at least 3 times a diameter of an initial bubble. A bubble having a diameter of 0.1 to 0.3 mm contained in a molten glass at 1400° C. before starting pressure reduction is defined as the initial bubble. A bubble after held at 33.33 kPa for 5 minutes corresponding to the initial bubble is defined as a grown bubble.

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