Monitoring of vapor density in vapor deposition furnance by emission spectroscopy
    1.
    发明授权
    Monitoring of vapor density in vapor deposition furnance by emission spectroscopy 失效
    通过排放光谱监测蒸气沉积物中的蒸气密度

    公开(公告)号:US3609378A

    公开(公告)日:1971-09-28

    申请号:US3609378D

    申请日:1966-10-31

    Applicant: AIR REDUCTION

    CPC classification number: C23C14/544 H01J37/304 H01J37/3053 H01J41/04

    Abstract: The rate of vapor deposition in a vacuum furnace heated by electron bombardment is monitored or controlled. The vapor is ionized, preferably by the same electron bombardment as produces it. The ionized vapor radiates light which is detected at one or more locations within the furnace, preferably by a photomultiplier optically coupled by a light pipe to the interior of the furnace. The light detector produces a signal indicative of the intensity of the light detected and, hence, of the vapor density. Optical filters may be used to pass light of frequency characteristic of particular elements, so that the relative intensity of the particular elements in the vapor may be selectively detected. The signals may be recorded or used to control the heating and, hence, vapor density, as by controlling the electron emission from an electron gun.

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