公开(公告)号：US20130308928A1

公开(公告)日：2013-11-21

申请号：US13895331

申请日：2013-05-15

Applicant: AP SYSTEMS INC.

Inventor： Chang-Kyo KIM ,  Sung-Chul KIM ,  Chang-Min KWON ,  Ki-Nam KIM

IPC: H01L21/67

CPC classification number: H01L21/67115

Abstract: The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.

Abstract translation: 本发明涉及一种加热器块和基板处理装置，更具体地涉及对基板进行热处理的加热器块和具有该加热块的基板处理装置。 根据本发明的实施例，提供了一种用于基板处理装置的加热器块，该基板处理装置的一侧具有加热灯，以将热量传递到经受热处理的目标，加热灯在多个区域中具有不同的布置图案 一方说