SUBSTRATE PROCESS CHAMBER EXHAUST
    1.
    发明申请
    SUBSTRATE PROCESS CHAMBER EXHAUST 审中-公开
    基板过程室排气

    公开(公告)号:US20140116336A1

    公开(公告)日:2014-05-01

    申请号:US14051010

    申请日:2013-10-10

    CPC classification number: B05B1/005 C23C16/4412 C30B25/14

    Abstract: Exhaust systems for substrate process chambers are provided herein. In some embodiments, an exhaust for a process chamber configured to process a substrate having a given width may include a body having an internal cavity and an opening disposed in a first side of the body, the opening fluidly coupled to the internal cavity; a plurality of through holes disposed through a second side of the body, the plurality of through holes fluidly coupled to the internal cavity, wherein the plurality of through holes are disposed symmetrically about the body with respect to a central axis of the body such that the plurality of through holes provide an equal length and pressure drop from the opening to each respective through hole; and a plurality of conduits, each having a first open end respectively coupled to the plurality of through holes.

    Abstract translation: 本文提供了衬底处理腔室的排气系统。 在一些实施例中,用于处理具有给定宽度的基板的处理室的排气可以包括具有内部空腔和设置在主体的第一侧中的开口的主体,该开口流体地联接到内部空腔; 多个穿过所述主体的第二侧的通孔,所述多个通孔流体地联接到所述内部空腔,其中所述多个通孔围绕所述主体相对于所述主体的中心轴对称地设置,使得所述多个通孔 多个通孔提供从开口到每个相应通孔的相同长度和压降; 以及多个管道,每个管道具有分别联接到所述多个通孔的第一开口端。

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