COMPLIANT ROBOT BLADE FOR DEFECT REDUCTION
    1.
    发明申请

    公开(公告)号:US20190267275A1

    公开(公告)日:2019-08-29

    申请号:US16405414

    申请日:2019-05-07

    Abstract: Embodiments of substrate transfer robot blades to engage and support a substrate during transfer are provided herein. In some embodiments, a substrate transfer robot may include a blade body having a blade support surface; and a plurality of compliant pads, each comprising a contact surface and an opposite bottom surface supported by the body and arranged to support a substrate when disposed on the substrate transfer robot blade.

    COMPLIANT ROBOT BLADE FOR DEFECT REDUCTION
    2.
    发明申请
    COMPLIANT ROBOT BLADE FOR DEFECT REDUCTION 审中-公开
    合适的机器人刀片,用于减少缺陷

    公开(公告)号:US20150078874A1

    公开(公告)日:2015-03-19

    申请号:US14487904

    申请日:2014-09-16

    CPC classification number: H01L21/68707 H01L21/67742

    Abstract: Embodiments of substrate transfer robot blades to engage and support a substrate during transfer are provided herein. In some embodiments, a substrate transfer robot may include a blade body having a blade support surface; and a plurality of compliant pads, each comprising a contact surface and an opposite bottom surface supported by the body and arranged to support a substrate when disposed on the substrate transfer robot blade.

    Abstract translation: 本文提供了在传送过程中接合和支撑衬底的衬底传送机器人刀片的实施例。 在一些实施例中,衬底传送机器人可以包括具有刀片支撑表面的刀片主体; 以及多个柔性衬垫,每个衬垫包括接触表面和由主体支撑的相对的底表面,并布置成当设置在衬底传送机械手刀片上时支撑衬底。

    SUBSTRATE TRANSFER ROBOT END EFFECTOR
    3.
    发明申请
    SUBSTRATE TRANSFER ROBOT END EFFECTOR 有权
    基板转移机器人终端效应器

    公开(公告)号:US20160005638A1

    公开(公告)日:2016-01-07

    申请号:US14476224

    申请日:2014-09-03

    CPC classification number: H01L21/68707 H01L21/67766

    Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes a support member; and a plurality of substrate contact elements protruding from the support member, wherein each of the plurality of substrate contact elements includes: a first contact surface to support a substrate when placed thereon; and a second contact surface extending from the first contact surface, wherein the second contact surface is adjacent a periphery of the substrate to prevent radial movement of the substrate, wherein the first contact surface is at a first angle with respect to the support member and the second contact surface is at a second angle with respect to the support member, and wherein the first angle is between about 3 degrees and 5 degrees.

    Abstract translation: 本文公开了用于支撑衬底的装置的实施例。 在一些实施例中,用于支撑衬底的装置包括支撑构件; 以及从所述支撑构件突出的多个基板接触元件,其中所述多个基板接触元件中的每一个包括:当放置在其上时支撑基板的第一接触表面; 以及从所述第一接触表面延伸的第二接触表面,其中所述第二接触表面邻近所述衬底的周边以防止所述衬底的径向移动,其中所述第一接触表面相对于所述支撑构件处于第一角度, 第二接触表面相对于支撑构件处于第二角度,并且其中第一角度在约3度和5度之间。

    SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION
    4.
    发明申请
    SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION 审中-公开
    基板支撑装置具有减少的基板颗粒生成

    公开(公告)号:US20150170954A1

    公开(公告)日:2015-06-18

    申请号:US14554945

    申请日:2014-11-26

    Abstract: Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.

    Abstract translation: 本文公开了用于支撑衬底的装置的实施例。 在一些实施例中,用于支撑衬底的装置包括:支撑表面; 以及从所述支撑面突出的多个基板接触元件,其中,所述多个基板接触元件由硬度小于或等于硅的硬度的材料形成,具有低粘附性,具有较大的静摩擦系数 足以防止具有小于或等于10Ra的表面粗糙度并且是导电的滑动。

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