公开(公告)号：US20160263634A1

公开(公告)日：2016-09-15

申请号：US15162160

申请日：2016-05-23

Applicant: APPLIED MATERIALS, INC.

Inventor： BALASUBRAMANIAN RAMACHANDRAN ,  MASATO ISHII ,  AARON MUIR HUNTER

IPC: B08B9/46 ,  C23C16/52 ,  G01N21/94 ,  C23C16/44 ,  B08B3/08 ,  B08B3/10

CPC classification number: B08B9/46 ,  B08B3/08 ,  B08B3/10 ,  C23C16/4405 ,  C23C16/52 ,  G01N21/94 ,  G01N2021/8416 ,  H01L21/67253

Abstract: Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a processing system having an endpoint detection system may include a process chamber having internal surfaces requiring periodic cleaning due to processes performed in the process chamber; and an endpoint detection system that includes a light detector positioned to detect light reflected off of a first internal surface of the process chamber; and a controller coupled to the light detector and configured to determine an endpoint of a cleaning process based upon the detected reflected light.

Abstract translation: 提供了用于确定处理室清洁过程的端点的方法和装置。 在一些实施例中，具有端点检测系统的处理系统可以包括处理室，其具有由于处理室中执行的处理而需要定期清洁的内表面; 以及端点检测系统，其包括被定位成检测从所述处理室的第一内表面反射的光的光检测器; 以及耦合到光检测器并被配置为基于检测到的反射光来确定清洁处理的端点的控制器。