公开(公告)号：US09598788B2

公开(公告)日：2017-03-21

申请号：US14037158

申请日：2013-09-25

Applicant: APPLIED Materials, Inc.

Inventor： Randy A. Harris ,  Bryan J. Puch

IPC: C25D5/48 ,  C25D17/00 ,  C25D21/00

CPC classification number: C25D5/48 ,  C25D17/001 ,  C25D17/005 ,  C25D21/00

Abstract: An electroplating apparatus has a rotor in a head, with a contact ring on the rotor. A lift/rotate actuator may move the head to position a sector of the contact ring into a deplate channel of a deplating station. Electrical current and a deplate liquid are applied directly onto the contacts of the contact ring, from a position radially inward of the contacts. Electrical current and a deplate liquid may also be separately applied onto the back side of the ring contact, from a position radially to the outside of the contact ring. A seal on the deplating station makes sliding contact with the contact ring as the contact ring rotates through the deplate channel, with the seal associated with an exhaust or vacuum opening that pulls deplating and rinse liquid through openings in the contact ring.

公开(公告)号：US20140083862A1

公开(公告)日：2014-03-27

申请号：US14037158

申请日：2013-09-25

Applicant: Applied Materials, Inc.

Inventor： Randy A. Harris ,  Bryan J. Puch

IPC: C25D5/48

CPC classification number: C25D5/48 ,  C25D17/001 ,  C25D17/005 ,  C25D21/00

Abstract: An electroplating apparatus has a rotor in a head, with a contact ring on the rotor. A lift/rotate actuator may move the head to position a sector of the contact ring into a deplate channel of a deplating station. Electrical current and a deplate liquid are applied directly onto the contacts of the contact ring, from a position radially inward of the contacts. Electrical current and a deplate liquid may also be separately applied onto the back side of the ring contact, from a position radially to the outside of the contact ring. A seal on the deplating station makes sliding contact with the contact ring as the contact ring rotates through the deplate channel, with the seal associated with an exhaust or vacuum opening that pulls deplating and rinse liquid through openings in the contact ring.

Abstract translation: 电镀设备在头部具有转子，转子上具有接触环。 提升/旋转致动器可以移动头部以将接触环的一个扇区定位到脱落台的去槽通道中。 从接触件径向向内的位置，将电流和去离子液体直接施加到接触环的触点上。 电流和去离子液体也可以从接触环的径向到外部的位置分开施加到环形接触的背面上。 脱模站上的密封件随着接触环通过凹槽通道旋转而与接触环滑动接触，密封件与排气或真空开口相关联，排气或真空开口通过接触环中的开口拉动脱液和冲洗液体。