专利检索 ap:("ASM IP HOLDING B.V.") AND inv:"Hannu A. Huotari" 第 1 页

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发明申请
SYSTEM AND METHODS FOR DIRECT LIQUID INJECTION OF VANADIUM PRECURSORS 有权

公开(公告)号：US20210371978A1

公开(公告)日：2021-12-02

申请号：US17329829

申请日：2021-05-25

申请人： ASM IP HOLDING B.V.

发明人： Eric James Shero , Dieter Pierreux , Bert Jongbloed , Werner Knaepen , Charles Dezelah , Qi Xie , Petri Raisanen , Hannu A. Huotari , Paul Ma , Vamsi Paruchuri

IPC分类号： C23C16/455 , C23C16/34

摘要： Direct liquid injection systems and vapor deposition systems including direct liquid injection systems are disclosed. Exemplary direct liquid injection systems and related vapor deposition systems can be configured for forming vanadium containing layer on a substrate by cyclical deposition processes.