公开(公告)号：US10246777B2

公开(公告)日：2019-04-02

申请号：US15620454

申请日：2017-06-12

Applicant: ASM IP HOLDING B.V.

Inventor： Hiroshi Kondo

IPC: C23C16/00 ,  C23C16/458 ,  H01J37/32 ,  C23C16/455

Abstract: A heater block adapted to be installed in a plasma deposition or plasma etching apparatus that includes a showerhead and a reaction chamber, the heater block being adapted to be arranged in the reaction chamber to support a substrate and includes: at least one through-hole passing through the heater block, and on its upper face a plurality of surfaces separated from each other and defined by a continuous concavity; and the continuous concavity including: a plurality of main concaves or depressions, a plurality of concave channels connecting substantially every two adjacent main concaves or depressions, and a concave or depression, at the center of the heater block, of a different shape or size from the plurality of main concaves or depressions.

公开(公告)号：US10354844B2

公开(公告)日：2019-07-16

申请号：US15594445

申请日：2017-05-12

Applicant: ASM IP HOLDING B.V.

Inventor： Hiroshi Kondo ,  Masaki Hirayama

IPC: H01J37/32

Abstract: An insulator for a processing apparatus including an upper electrode, a lower electrode and a reaction chamber, the insulator being adapted to be arranged around the upper electrode and the insulator including: a bottom end adapted to face the reaction chamber; and a side wall facing a side wall of the upper electrode, wherein an edge portion of the bottom end of the insulator extends radially inwardly to form a projecting portion such that the projecting portion covers an edge of a bottom surface of the upper electrode and a clearance between the side wall of the upper electrode and the side wall of the insulator.

公开(公告)号：USD859484S1

公开(公告)日：2019-09-10

申请号：US29607328

申请日：2017-06-12

Applicant: ASM IP HOLDING B.V.

Designer： Hiroshi Kondo