公开(公告)号：US20240240323A1

公开(公告)日：2024-07-18

申请号：US18411900

申请日：2024-01-12

Applicant: ASM IP Holding B.V.

Inventor： Ryan Paull ,  Andrew O'Reilly ,  Ashwin Agathya Boochakravarthy ,  Jereld Lee Winkler ,  Chen Ni ,  Gnyanesh Trivedi

IPC: C23C16/52 ,  C23C16/455 ,  F16K7/00 ,  G05D16/20

CPC classification number: C23C16/52 ,  C23C16/45544 ,  C23C16/45557 ,  F16K7/00 ,  G05D16/2013

Abstract: A reactor system configured to use valve pulsing to control precursor pressure as part of substrate or other processing. A controller in the reactor system runs a pressure control module to process pressure signals from a pressure sensor sensing pressure within an accumulator disposed between a reaction chamber and a precursor source vessel. Based on a pressure set point for the accumulator and the sensed pressure feedback, the controller generates valve control or valve pulsing signals to operate one or more fill valves used to control fill of the accumulator with gas (e.g., precursor) from the precursor source vessel. The fill valves may be high-speed diaphragm valves configured for operation in high temperature applications to be fully opened or fully closed, and the control signals cause the valves to rapidly pulse open and closed to adjust the pressure within the accumulator.