公开(公告)号：US20240218508A1

公开(公告)日：2024-07-04

申请号：US18609379

申请日：2024-03-19

Applicant: ASM IP Holding B.V.

Inventor： Aniket Nitin Patil ,  Saket Rathi ,  Sam Kim ,  Shiva K.T. Rajavelu Muralidhar

IPC: C23C16/455 ,  B23Q3/00 ,  C23C16/458 ,  C23C16/52

CPC classification number: C23C16/455 ,  B23Q3/00 ,  C23C16/4582 ,  C23C16/52

Abstract: A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.

公开(公告)号：US20220186369A1

公开(公告)日：2022-06-16

申请号：US17549022

申请日：2021-12-13

Applicant: ASM IP Holding B.V.

Inventor： Aniket Nitin Patil ,  Saket Rathi ,  Sam Kim ,  Shiva K.T. Rajavelu Muralidhar

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/52

Abstract: A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.

公开(公告)号：US11946137B2

公开(公告)日：2024-04-02

申请号：US17549022

申请日：2021-12-13

Applicant: ASM IP Holding B.V.

Inventor： Aniket Nitin Patil ,  Saket Rathi ,  Sam Kim ,  Shiva K. T. Rajavelu Muralidhar

IPC: B23Q3/00 ,  C23C16/455 ,  C23C16/458 ,  C23C16/52

CPC classification number: C23C16/455 ,  B23Q3/00 ,  C23C16/4582 ,  C23C16/52

Abstract: A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.

公开(公告)号：US20220199444A1

公开(公告)日：2022-06-23

申请号：US17551586

申请日：2021-12-15

Applicant: ASM IP Holding B.V.

Inventor： Theodorus G.M. Oosterlaken ,  Aniket Nitin Patil ,  Nimit Kothari

IPC: H01L21/677

Abstract: The disclosure relates to a wafer processing apparatus for processing wafers with a rotatable table provided with a support constructed and arranged to support a removable holder for storing a plurality of wafers. A drive assembly may be provided to provide a rotary movement to the rotatable table around a vertical axis perpendicular to the table; and, a supply line may be constructed and arranged to supply utilities to the rotatable table. The drive assembly may be controlled and configured to create the rotary movement of the table in a clockwise and/or an anticlockwise direction to avoid breakage of the supply line.