公开(公告)号：US11526091B2

公开(公告)日：2022-12-13

申请号：US17600174

申请日：2020-03-25

Applicant: ASML HOLDING N.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Justin Lloyd Kreuzer ,  Yuxiang Lin ,  Kirill Urievich Sobolev

IPC: G03F9/00

Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.

公开(公告)号：US10247940B2

公开(公告)日：2019-04-02

申请号：US15777908

申请日：2016-11-21

Applicant: ASML HOLDING N.V.

Inventor： Kirill Urievich Sobolev

IPC: G03F9/00 ,  G02B27/00 ,  G02B21/02 ,  G01B9/02 ,  G01B11/27 ,  G02B17/02 ,  G03F7/20

Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.